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Journal Articles

Study on modeling of thermal desorption spectra of hydrogen including variation of vacancy-type trap sites

Ebihara, Kenichi; Saito, Kei*; Takai, Kenichi*

"Suiso Zeika No Kihon Yoin To Tokusei Hyoka Kenkyukai Chukan Hokokukai" Shimposium Yokoshu (USB Flash Drive), p.30 - 35, 2016/09

no abstracts in English

Journal Articles

Annealing of vacancy-type defect and diffusion of implanted boron in 6H-SiC

Oshima, Takeshi; Uedono, Akira*; Eryu, Osamu*; Lee, K. K.; Abe, Koji*; Ito, Hisayoshi; Nakashima, Kenshiro*

Materials Science Forum, 433-436, p.633 - 636, 2003/08

no abstracts in English

Journal Articles

Positron annihilation study of vacancy-type defects in silicon carbide co-implanted with aluminum and carbon ions

Oshima, Takeshi; Uedono, Akira*; Abe, Hiroshi; Chen, Z. Q.*; Ito, Hisayoshi; Yoshikawa, Masahito; Abe, Koji*; Eryu, Osamu*; Nakashima, Kenshiro*

Physica B; Condensed Matter, 308-310, p.652 - 655, 2001/12

 Times Cited Count:6 Percentile:59.86

Co-implantation of Al(2E18/cm3) and C(1E18/cm3) into 6H-SiC and subsequent thermal annealing up to 1650 C werer carried out. Vacancy-type defects in the implanted layer were studied by monoenergetic positron beams. The mean size of vacancy-type defects in as-implanted samples is found to be close to the size of divacancy. Although vacancy clsters near a surface region were created by 1000 C-annealing, clustering is suppressed in a deep region.The mean size of vacancys decrease by annealing above 1000 C, and major vacancy defects annealed out after annealing at 1400 C. No significant difference in defect annealing between only Al- and co-implanted samles was observed.This result suggests that electrical activation of Al is enhanced by the site competition mechanism.

Journal Articles

Relationship between donor activation and defect annealing in 6H-SiC hot-implanted with phosphrous ions

Oshima, Takeshi; Uedono, Akira*; Ito, Hisayoshi; Yoshikawa, Masahito; Kojima, Kazutoshi; Okada, Sohei; Nashiyama, Isamu; Abe, Koji*; Tanigawa, Shoichiro*; Frank, T.*; et al.

Materials Science Forum, 338-342, p.857 - 860, 2000/00

no abstracts in English

Journal Articles

Oxygen-related defects in O$$^{+}$$-implanted 6H-SiC studied by monoenergetic positron beams

Uedono, Akira*; Tanigawa, Shoichiro*; Oshima, Takeshi; Ito, Hisayoshi; Aoki, Yasushi; Yoshikawa, Masahito; Nashiyama, Isamu

Journal of Applied Physics, 86(10), p.5392 - 5398, 1999/00

 Times Cited Count:9 Percentile:54.52(Physics, Applied)

no abstracts in English

Journal Articles

Investigation of vacancy-type defects in P$$^{+}$$-implanted 6H-SiC using monoenergetic positron beams

Uedono, Akira*; Oshima, Takeshi; Ito, Hisayoshi; Suzuki, Ryoichi*; *; Tanigawa, Shoichiro*; Aoki, Yasushi; Yoshikawa, Masahito; Nashiyama, Isamu; Mikado, Tomohisa*

Japanese Journal of Applied Physics, Part 1, 37(5A), p.2422 - 2429, 1998/05

 Times Cited Count:12 Percentile:46.08(Physics, Applied)

no abstracts in English

Journal Articles

Characterization of vacancy-type defects and phosphorus donors introduced in 6H-SiC by ion implantation

Oshima, Takeshi; Uedono, Akira*; Abe, Koji*; Ito, Hisayoshi; Aoki, Yasushi; Yoshikawa, Masahito; Tanigawa, Shoichiro*; Nashiyama, Isamu

Applied Physics A, 67(4), p.407 - 412, 1998/00

 Times Cited Count:25 Percentile:26.2(Materials Science, Multidisciplinary)

no abstracts in English

Journal Articles

Study of thermal annealing of vacancies in ion implanted 3C-SiC by positron annihilation

Oshima, Takeshi; Uedono, Akira*; Ito, Hisayoshi; Abe, Koji*; Suzuki, Ryoichi*; *; Aoki, Yasushi; Tanigawa, Shoichiro*; Yoshikawa, Masahito; Mikado, Tomohisa*; et al.

Mater. Sci. Forum, 264-268, p.745 - 748, 1998/00

no abstracts in English

Journal Articles

Defects in ion-implanted 3C-SiC probed by a monoenergetic positron beam

Uedono, Akira*; Ito, Hisayoshi; Oshima, Takeshi; Aoki, Yasushi; Yoshikawa, Masahito; Nashiyama, Isamu; Okumura, Hajime*; Yoshida, Sadafumi*; *; *; et al.

Japanese Journal of Applied Physics, Part 1, 35(12A), p.5986 - 5990, 1996/12

no abstracts in English

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