Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Imanaka, Soichi*; Okada, Michio*; Kasai, Toshio*; Teraoka, Yuden; Yoshigoe, Akitaka
JAERI-Tech 2003-066, 36 Pages, 2003/08
The reactions of organic molecules with a Si(001) surface play important roles in many applied fields such as LSI, molecular device, sensor, non-liner optical materials, catalysis, coating, preservation from decay, and so on. Especially, the dissociative adsorption of CHCl is an important initial process in the production of diamond and silicon carbide thin films. However, it is required to control the orientation of CH
Cl for the elucidation of the detailed mechanism of the dissociative adsorption. In the present experiments, we studied the dissociative adsorption of CH
Cl on a clean Si(001) surface under ultra-high vacuum using Scanning Tunneling Microscopy (STM). We found, for the first time, that there are two reaction passes of CH
Cl(g) to CH
(a)+Cl(a) and CH
Cl(g) to CH
(a)+Cl(g) in the dissociative adsorption of CH
Cl on the Si
surface.
Tsukada, Chie; Yoshida, Hikaru; Okada, Michio*; Yoshigoe, Akitaka; Yaita, Tsuyoshi
no journal, ,
Cs in clay mineral will be easy to desorb as halide. We should investigate the desorption mechanism. The clay mineral is constructed mainly by oxide with Si and Al. Thus, Si substrate and CHCl are selected as the reaction model materials. The final purpose is to reveal the reaction for CH
Cl molecular beam on Cs/Si substrate by means of XPS with synchrotron radiation (SR-XPS). As the first step, the purpose in this study is to reveal the adsorption reaction for CH
Cl molecular beam on Si(100)2
1 by means of SR-XPS. The CH
Cl will adsorb at CH
and/or Cl group on the Si dimer atom, respectively.
Tsukada, Chie; Yoshida, Hikaru; Okada, Michio*; Yoshigoe, Akitaka; Yaita, Tsuyoshi
no journal, ,
To achieve Cs decontamination in clay minerals by using CHCl gas, we have investigated the adsorption reactions and adsorption states of CH
Cl at Si surfaces. In this conference, we report that dissociative adsorption of CH
Cl to form CH
and Cl was revealed from the high energy-resolutions photoemission spectra.