Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Vauchy, R.; Hirooka, Shun; Matsumoto, Taku; Kato, Masato
Frontiers in Nuclear Engineering (Internet), 1, p.1060218_1 - 1060218_18, 2022/12
Imazono, Takashi; Yanagihara, Mihiro*
Photon Factory News, 22(3), p.18 - 22, 2004/11
Using soft-X-ray fluorescence spectroscopy with photon incidence at a critical angle of total reflection, it was made clear that SiO
existed within a depth of a few nanometers from the surface of Fe/Si multilayers. It was generated by oxidation of the interdiffused Fe
Si layer nearest to the topmost Fe layer. Consequently, the Fe
Si layer was found to decrease in thickness. This result suggests that the total-reflection soft-X-ray fluorescence spectroscopy is fairly useful to analyze the chemical state of elements to a depth of a few nanometers from the surface.
Ogata, Takanari*; Akabori, Mitsuo; Ito, Akinori
Materials Transactions, 44(1), p.47 - 52, 2003/10
Times Cited Count:14 Percentile:60.83(Materials Science, Multidisciplinary)Diffusion behavior of Ce in U-Zr alloys was studied from the interdiffusion with diffusion couples. The diffusion coefficients of Ce in the U-Zr solid solutions (
U,
Zr) were estimated to be 2
10
and 6
10
m
/s at 1023 and 1123 K, respectively. The result also indicated that Ce does not significant influence on interdiffusion in the U-Zr solid solutions.