Refine your search:     
Report No.
 - 
Search Results: Records 1-4 displayed on this page of 4
  • 1

Presentation/Publication Type

Initialising ...

Refine

Journal/Book Title

Initialising ...

Meeting title

Initialising ...

First Author

Initialising ...

Keyword

Initialising ...

Language

Initialising ...

Publication Year

Initialising ...

Held year of conference

Initialising ...

Save select records

Journal Articles

Perpendicular magnetic anisotropy of thin films

Takanashi, Koki; Seki, Takeshi*

Magune, 19(3), p.100 - 106, 2024/06

Perpendicular magnetic anisotropy of thin films currently plays an important role in spintronics as well as magnetic recording. Regarding perpendicular magnetic anisotropy, in this article, the fundamentals, the research history, and the recent research trends are reviewed, showing specific examples with perpendicular magnetization such as magnetic multilayers, ordered alloy films, rare earth-transition metal amorphous alloy films, and inhomogeneous or granular films. The physical origins for perpendicular magnetic anisotropy, including interface anisotropy due to structural symmetry breaking, magnetoelastic anisotropy due to strain, bulk-type magnetocrystalline anisotropy, and directional pair ordering of atoms, are discussed in each example.

Journal Articles

X-ray photoelectron spectroscopy studies of post-oxidation process effects on oxide/SiC interfaces

Hijikata, Yasuto*; Yaguchi, Hiroyuki*; Yoshikawa, Masahito; Yoshida, Sadafumi*

Materials Science Forum, 389-393, p.1033 - 1036, 2002/05

no abstracts in English

Journal Articles

Measurements of the depth profile of the refractive indices in oxide films on SiC by spectroscopic ellipsometry

Iida, Takeshi*; Tomioka, Yuichi*; Yoshimoto, Kimihiro*; Midorikawa, Masahiko*; Tsukada, Hiroyuki*; Orihara, Misao*; Hijikata, Yasuto*; Yaguchi, Hiroyuki*; Yoshikawa, Masahito; Ito, Hisayoshi; et al.

Japanese Journal of Applied Physics, Part 1, 41(2A), p.800 - 804, 2002/02

 Times Cited Count:17 Percentile:54.79(Physics, Applied)

no abstracts in English

Journal Articles

The Investigation of 4H-SiC/SiO$$_{2}$$ interfaces by optical and electrical measurements

Ishida, Yuki*; Takahashi, Tetsuo*; Okumura, Hajime*; Jikimoto, Tamotsu*; Tsuchida, Hidekazu*; Yoshikawa, Masahito; Tomioka, Yuichi*; Midorikawa, Masahiko*; Hijikata, Yasuto*; Yoshida, Sadafumi*

Materials Science Forum, 389-393, p.1013 - 1016, 2002/00

 Times Cited Count:5 Percentile:23.24(Materials Science, Multidisciplinary)

no abstracts in English

4 (Records 1-4 displayed on this page)
  • 1