Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Baba, Yuji; Sekiguchi, Tetsuhiro; Shimoyama, Iwao; Nath, K. G.
Applied Surface Science, 237(1-4), p.176 - 180, 2004/10
Times Cited Count：9 Percentile：43.13(Chemistry, Physical)no abstracts in English
-FeSi
filmsIgarashi, Shinichi; Katsumata, Toshinobu; Haraguchi, Masaharu; Saito, Takeru; Yamaguchi, Kenji; Yamamoto, Hiroyuki; Hojo, Kiichi
Transactions of the Materials Research Society of Japan, 28(4), p.1153 - 1156, 2003/12
We have evaluated the crystal structure of the -FeSi films formed with various sputter etching of Si substrate. Ne
sputter etching of Si (100) substrate was performed with ion energies of 1, 3, and 10 keV. After each etching, the substrate was annealed at a temperature of 1073 K for 30 min. The -FeSi films of 100 nm in thickness were formed at 973 K with the amount of deposited Fe, 30 nm. X-ray diffraction revealed that these films have polycrystalline -FeSi structure but strong preferential orientation aligned as -FeSi (100) // Si (100). Furthermore, the oriented structure of the film was improved by lowering the incident energy of Ne.
Meigo, Shinichiro; Harada, Masahide; Teraoku, Takuji*; Maekawa, Fujio
Proceedings of ICANS-XVI, Volume 3, p.1175 - 1180, 2003/07
It is important to monitor the proton beam for the high intensity pulse spallation target. Especially for the beam halo, which may irradiate the bulk surrounding the target, it is important to be observed to prevent causing heat spot in the shielding bulk. At JSNS, a proton beam monitors are located at front of the target. These monitors are assembled with the proton beam window. Since this scheme increases the radiation on the monitor due to the beam loss at the windows, it may arise heat deposition on the monitor. Therefore, heat deposition is calculated with NMTC/JAM. It is found that the heat deposition for normal operation is less than 0.1 W/cc.
Zhu, X. D.; Naramoto, Hiroshi; Xu, Y.; Narumi, Kazumasa; Miyashita, Kiyoshi*
Physical Review B, 66(16), p.165426_1 - 165426_5, 2002/10
Times Cited Count：14 Percentile：56.71(Materials Science, Multidisciplinary)no abstracts in English
Naramoto, Hiroshi; Xu, Y.; Narumi, Kazumasa; Vacik, J.; Zhu, X.; Yamamoto, Shunya; Miyashita, Kiyoshi*
Materials Research Society Symposium Proceedings, Vol.647, p.O5.18.1 - O5.18.16, 2001/00
no abstracts in English
Kikuchi, Kenji; Nakashima, Hiroshi; Ishikura, Shuichi*; Futakawa, Masatoshi; Hino, Ryutaro
Journal of the Physical Society of Japan, 37(2), p.113 - 119, 2000/02
no abstracts in English
Nishimura, Akihiko; ; Oba, Hironori; Shibata, Takemasa
Journal of Nuclear Science and Technology, 30(3), p.270 - 273, 1993/03
Times Cited Count：13 Percentile：82.35(Nuclear Science & Technology)no abstracts in English
