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Kobayashi, Yasuhiko; Funayama, Tomoo; Wada, Seiichi; Hamada, Nobuyuki*
JAERI-Conf 2005-012, 53 Pages, 2005/09
JAERI-Conf-2005-012.pdf:5.11MB
no abstracts in English
Shikazono, Naoya; Hase, Yoshihiro; Sakamoto, Ayako; Ono, Yutaka; Tanaka, Atsushi
JAERI-Conf 2004-001, 72 Pages, 2004/03
JAERI-Conf-2004-001.pdf:4.88MB
Induction of novel plant resources by ion beam-irradiation has been investigated in JAERI. To share the knowledge of the present status of the field, and to find out future plans, 1st Workshop on ion beam-applied biology was held last year by Department of Ion-beam-Applied Biology. To further improve the research cooperation and to exchange useful information in the field, researchers inside JAERI and also with researchers outside, such as those from Universities, Research institutes, agricultural experiment stations, and companies, met each other at the 2nd workshop on ion beam-applied biology. This workshop was held by Department of Ion-beam-Applied Biology on November 21, 2003 under the joint auspices of Kanto 
Kouetsu branch of Atomic Energy Society of Japan, Breeding Science Society of Japan, and Genetics Society of Japan, and 134 people participated. Highly qualified presentations were given on studies with new irradiation techniques, on novel varieties, and on future plans. Many more new plant resources are now expected to be produced by ion beam irradiation.
-irradiated diamondXu, Y.; Naramoto, Hiroshi; Narumi, Kazumasa; Miyashita, Kiyoshi*; Kamiya, Tomihiro; Sakai, Takuro
Applied Physics Letters, 83(10), p.1968 - 1970, 2003/09
Times Cited Count：6 Percentile：27.48(Physics, Applied)no abstracts in English
Zhu, X. D.; Naramoto, Hiroshi; Xu, Y.; Narumi, Kazumasa; Miyashita, Kiyoshi*
Physical Review B, 66(16), p.165426_1 - 165426_5, 2002/10
Times Cited Count：14 Percentile：56.41(Materials Science, Multidisciplinary)no abstracts in English
Naramoto, Hiroshi; Xu, Y.; Narumi, Kazumasa; Vacik, J.; Zhu, X.; Yamamoto, Shunya; Miyashita, Kiyoshi*
Materials Research Society Symposium Proceedings, Vol.647, p.O5.18.1 - O5.18.16, 2001/00
no abstracts in English
Seguchi, Tadao
Hoshasen To Sangyo, 11(81), p.48 - 49, 1999/03
no abstracts in English
Saido, Masahiro; Fukuda, Mitsuhiro; Arakawa, Kazuo; Tajima, Satoshi; Sunaga, Hiromi; Yotsumoto, Keiichi; Tanaka, Ryuichi
Proceedings of 3rd International Workshop on Radiation Effects on Semiconductor Devices for Space Application, p.183 - 188, 1998/00
no abstracts in English
Abe, Hiroaki; Naramoto, Hiroshi; Hojo, Kiichi; Furuno, Shigemi
JAERI-Research 96-047, 18 Pages, 1996/09
JAERI-Research-96-047.pdf:0.96MB
no abstracts in English
and VO
after rare-gas sputteringSasaki, Teikichi; Baba, Yuji; Yamamoto, Hiroyuki; Sasase, Masato*;
Surface and Interface Analysis, 20, p.682 - 686, 1993/00
Times Cited Count：4 Percentile：21.04(Chemistry, Physical)no abstracts in English
Koshikawa, Hiroshi; Asano, Masaharu*; Yamaki, Tetsuya; Maekawa, Yasunari
no journal, ,
We investigated track etch rates (V
) of polyimide irradiated with different ions by a conductivity technique and their LET dependence. Both of 12 and 25 
m thick films were irradiated with 450 MeV 
Xe, 250 MeV 
Ar and 75 MeV 
Ne and then were etched with a sodium hypochlorite solution. The conductometric analysis involves recording electric conductance of the etchant across the film during the etching time. When the etched pores from both sides of the film made contact with each other, the conductance suddenly increased to find the breakthrough time (T
). A V value was obtained by dividing the half thickness of the films by T. The Xe ions with the highest LET of 12 MeV/m gave ca. 20 times higher V than the Ne ions. The change in V for the different beams is ascribed to an LET effect by considering that the bombardment with high-LET ions produces more severe molecular damage in each track.
