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Journal Articles

X-ray rocking curve study of the strain profile formed by MeV ion implantation into(111)silicon wafers

; Tomimitsu, Hiroshi; ; ; ; Aizawa, Kazuya; Okayasu, Satoru; ; Kazumata, Yukio*; Y.C.Jiang*; et al.

Japanese Journal of Applied Physics, Part 1, 36(12A), p.7296 - 7301, 1997/12

https://doi.org/10.1143/JJAP.36.7296
 Times Cited Count：6 Percentile：36.24(Physics, Applied)

no abstracts in English

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