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狩野 圭佑*; 猿谷 良太*; 川端 駿介*; 新木 潤*; 野口 克也*; 加田 渉*; 三浦 健太*; 加藤 聖*; 佐藤 隆博; 江夏 昌志; et al.
no journal, ,
Proton beam writing (PBW) has been applied to fabricate Mach-Zehnder (MZ) optical waveguides which is expected to be an optical switch with small power consumption, because only one processing of PBW enables us to fabricate such waveguides even inside of plastic materials. Such waveguides were fabricated in thin poly-methyl-methacrylate (PMMA) films by PBW. However, they had low transmittance. In order to fabricate MZ optical waveguides with higher transmittance, PBW was applied to poly-dimethyl-siloxane (PDMS) with higher transparency than PMMA. Thirty-micrometer thick PDMS films formed on silicon wafers were irradiated at different beam fluences using a 750-keV proton microbeam which reaches the half depth of the entire film thickness. The single mode propagation of the fabricated optical waveguide was checked by the 1.55-m light. The observation results showed that the single-mode propagation was detected only for the waveguide fabricated with the fluence of 100 nC/mm
and that the propagated light intensity was higher than that of PMMA. The waveguide structure has been successfully fabricated in thin PDMS films by PBW.
関根 由莉奈; 南川 卓也; 諸橋 裕子
not registered
【課題】極めて低コストかつ短時間に、汎用性の高いマイクロ流路デバイスを製造する方法を提供すること。 【解決手段】マイクロ流路デバイスの製造方法は、基板1、粘着層2、及びカッティング層3が順次積層された多層の構造体に対し、カッティング層3の側からレーザー光線10を照射し、カッティング層3、またはカッティング層3と粘着層2にマイクロ流路パターンを形成する工程と、その後、形成されたマイクロ流路パターンを剥離させる工程、を含むことを特徴とする。