Deuterium trapping in tungsten deposition layers formed by deuterium plasma sputtering

Alimov, V.; Roth, J.*; Shu, Wataru*; Komarov, D. A.*; Isobe, Kanetsugu; Yamanishi, Toshihiko

Journal of Nuclear Materials, 399(2-3), p.225 - 230, 2010/04

https://doi.org/10.1016/j.jnucmat.2010.01.024

A study of the influence of the deposition conditions on the surface morphology and deuterium concentration in tungsten deposition layers formed by magnetron sputtering and in the linear plasma generator has been carried out. Adhesion of the W layer to substrate is shown to depend on the coefficients of thermal expansion for tungsten and substrate material, thickness of the W layer, and the substrate temperature during layer deposition. A decreased D concentration for increased substrate temperatures and deposition rate are observed.