Interaction of soft X-ray laser pulse radiation with aluminum surface; Nano-meter size surface modification

Ishino, Masahiko; Faenov, A.*; Tanaka, Momoko; Hasegawa, Noboru; Nishikino, Masaharu; Tamotsu, Satoshi*; Pikuz, S.*; Inogamov, N. A.*; Zhakhovsky, V. V.*; Skobelev, I.*; et al.

AIP Conference Proceedings 1465, p.236 - 240, 2012/07

https://doi.org/10.1063/1.4737565

We irradiated the focusing soft X-ray laser pulses having a wavelength of 13.9 nm and the duration of 7 ps to aluminum surface. After the irradiation process, the irradiated surface was observed with a scanning electron microscope. The surface modifications caused by soft X-ray laser single pulse exposure were clearly seen. In addition, it was found that the conical structures having around 100 nm in diameters were formed in the shallow features. The nano-meter size modified surface structures on aluminum induced by the soft X-ray laser pulse is interesting as the newly surface structure. Hence, the soft X-ray laser beam would be a candidate for a tool of micromachining. We also provide a thermomechanical modeling of the soft X-ray laser interaction with aluminum briefly to explain the surface modification.

Two-temperature warm dense matter produced by ultrashort Extreme Vacuum Ultraviolet-Free Electron Laser (EUV-FEL) pulse

Inogamov, N. A.*; Faenov, A. Ya.*; Zhakhovsky, V. V.*; Pikuz, T. A.*; Skobelev, I. Yu.*; Petrov, Y. V.*; Khokhlov, V. A.*; Shepelev, V. V.*; Anisimov, S. I.*; Fortov, V. E.*; et al.

Contributions to Plasma Physics, 51(5), p.419 - 426, 2011/06

https://doi.org/10.1002/ctpp.201110013

Warm dense matter, arising under the action of ultrashort EUV-FEL pulse onto LiF dielectric crystal, is characterized by high temperature of conduction electrons, with their number density achieving values of the order of atom number density at maximum laser fluences in our experiments. Expansion of matter, heated and pressurized through the electron-ion energy exchange, gives rise to the spallative ablation at small fluences and gaseous outflow from a target in the case of large fluences. Ablation threshold is low in comparison with a longer nanosecond XRL.

Spallative ablation of dielectrics by X-ray laser

Inogamov, N. A.*; Zhakhovsky, V. V.*; Faenov, A. Ya.*; Khokhlov, V. A.*; Shepelev, V. V.*; Skobelev, I. Y.*; Kato, Yoshiaki*; Tanaka, Momoko; Pikuz, T. A.*; Kishimoto, Maki; et al.

Applied Physics A, 101(1), p.87 - 96, 2010/10

https://doi.org/10.1007/s00339-010-5764-3