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Journal Articles

Characterizing SRAM and FF soft error rates with measurement and simulation

Hashimoto, Masanori*; Kobayashi, Kazutoshi*; Furuta, Jun*; Abe, Shinichiro; Watanabe, Yukinobu*

Integration, 69, p.161 - 179, 2019/11

 Times Cited Count:11 Percentile:62.39(Computer Science, Hardware & Architecture)

Soft error originating from cosmic ray is a serious concern for reliability demanding applications. Device miniaturization and lower voltage operation degrade the immunity of SRAM and flip-flops, and then soft error countermeasures will be demanded in more and more products. This paper characterizes and discusses soft error rates of SRAM and flip-flops in the terrestrial environment with the results of investigation for soft error phenomena by measurements and simulations.

Journal Articles

Occurrence and potential activity of denitrifiers and methanogens in groundwater at 140 m depth in Pliocene diatomaceous mudstone of northern Japan

Katsuyama, Chie*; Nashimoto, Hiroaki*; Nagaosa, Kazuyo*; Ishibashi, Tomotaka*; Furuta, Kazuki*; Kinoshita, Takeshi*; Yoshikawa, Hideki; Aoki, Kazuhiro; Asano, Takahiro*; Sasaki, Yoshito; et al.

FEMS Microbiology Ecology, 86(3), p.532 - 543, 2013/12

 Times Cited Count:14 Percentile:36.52(Microbiology)

Anaerobic microbial activity has a major influence on the subsurface environment, and should be considered in subsurface activities including the construction of radioactive waste repositories. We investigated denitrification and methanogenesis in anoxic groundwater from 140 m depth in two boreholes, where the redox potential fluctuated. The average maximum potential denitrification rates, measured under anaerobic conditions in the two boreholes using an $$^{15}$$N tracer. Methanogenesis candidates were detected by 16S rRNA gene analysis. Although the stable isotope signatures suggested that some of the dissolved methane was of biogenic origin, no potential for methane production was evident during the incubations. The groundwater at 140 m depth did not contain oxygen, had an Eh ranging from -144 to 6.8 mV, and was found to be a potential field for denitrification.

Journal Articles

Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA

Kamiya, Tomihiro; Takano, Katsuyoshi; Ishii, Yasuyuki; Sato, Takahiro; Oikawa, Masakazu*; Okubo, Takeru; Haga, Junji*; Nishikawa, Hiroyuki*; Furuta, Yusuke*; Uchiya, Naoyuki*; et al.

Nuclear Instruments and Methods in Physics Research B, 267(12-13), p.2317 - 2320, 2009/06

 Times Cited Count:7 Percentile:47.04(Instruments & Instrumentation)

Journal Articles

Development of micromachining technology in ion microbeam system at TIARA, JAEA

Kamiya, Tomihiro; Nishikawa, Hiroyuki*; Sato, Takahiro; Haga, Junji; Oikawa, Masakazu*; Ishii, Yasuyuki; Okubo, Takeru; Uchiya, Naoyuki; Furuta, Yusuke*

Applied Radiation and Isotopes, 67(3), p.488 - 491, 2009/03

 Times Cited Count:4 Percentile:30.43(Chemistry, Inorganic & Nuclear)

Development of a mask-less ion beam lithography technique for fabricating micro- or nano-meter sized structures has been started at the microbeam systems in the ion accelerator facility of JAEA Takasaki (TIARA) in collaboration with Shibaura Institute of Technology. In order to obtain a high precision measure for microbeam size estimation and lens system optimization, or for improvement of spatial resolution down to 100 nm level, we applied this lithography technique itself combined with the electroplating process to make a Ni relief pattern as an optimum resolution standard to be used in secondary electron imaging. In this work, using this standard, the smallest beam size could be obtained. This paper also discuses on the scattering of ions in the materials influenced to the resolution using a Monte Carlo simulation code.

Journal Articles

Ni electroplating on a resist micro-machined by proton beam writing

Uchiya, Naoyuki*; Furuta, Yusuke*; Nishikawa, Hiroyuki*; Watanabe, Toru*; Haga, Junji; Sato, Takahiro; Oikawa, Masakazu; Ishii, Yasuyuki; Kamiya, Tomihiro

Microsystem Technologies, 14(9-11), p.1537 - 1540, 2008/10

 Times Cited Count:17 Percentile:64.29(Engineering, Electrical & Electronic)

Oral presentation

Production of 3-D resit structures on silicon plates by a proton beam writing technique

Furuta, Yusuke*; Uchiya, Naoyuki*; Nishikawa, Hiroyuki*; Haga, Junji; Oikawa, Masakazu*; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro

no journal, , 

no abstracts in English

Oral presentation

Micro-machining of resists by proton beam writing, 2; Fabrication of 3-D structures using a negative resist

Uchiya, Naoyuki; Furuta, Yusuke*; Nishikawa, Hiroyuki*; Haga, Junji; Sato, Takahiro; Oikawa, Masakazu*; Okubo, Takeru; Ishii, Yasuyuki; Kamiya, Tomihiro; Yamamoto, Shunya

no journal, , 

no abstracts in English

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