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Journal Articles

Micro-/nanofabrication of cross-linked poly($$_{rm L}$$-lactic acid) using electron beam nanoimprint lithography

Okubo, Satoshi*; Nagasawa, Naotsugu; Kobayashi, Akinobu*; Oyama, Tomoko*; Taguchi, Mitsumasa; Oshima, Akihiro*; Tagawa, Seiichi*; Washio, Masakazu*

Applied Physics Express, 5(2), p.027303_1 - 027303_3, 2012/02

https://doi.org/10.1143/APEX.5.027303
 Times Cited Count：4 Percentile：18.13(Physics, Applied)

Electron beam nanoimprint lithography was proposed for fabricating the micro-/nanostructures of cross-linked poly($$_{rm L}$$-lactic acid) (RX-PLLA). PLLA with triallyl isocyanurate (TAIC) solutions were dropped on the Si-molds fabricated by the conventional EB lithography technique. PLLA/TAIC on Si-molds were imprinted and cross-linked with doses from 10 to 500 kGy at room temperature under vacuum. The micro-/nanostructures of RX-PLLA were successfully obtained with high accuracy. Hence, it was found that the imprinted structures of RX-PLLA (100 kGy irradiation) show low line edge roughness and high thermal durability at 120 $$^{circ}$$C.

Oral presentation

Fluorination of Si mold by EB irradiation & nanoimprint of high adhesion material using fluorinated mold

Kobayashi, Akinobu*; Hinata, Toru*; Okubo, Satoshi*; Oyama, Tomoko; Nagasawa, Naotsugu; Taguchi, Mitsumasa; Oshima, Akihiro*; Tagawa, Seiichi*; Washio, Masakazu*

no journal, , 

In this study, a Si mold used for micro/nano fabrication of polytetrafluoroethylene (PTFE) via Thermal and Radiation process for Fabricationprocess (TRaf process) was investigated with X-ray photoelectron spectroscopy. It was found that the surface of Si mold was fluorinated by TRaf process. This fluorinated Si mold was applied for nanoimprint lithography (NIL) of high adhesion material without release agent. As a result, NIL of poly($$varepsilon$$-caprolactone) was successfully performed.

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