Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Takeuchi, Tomoaki; Otsuka, Noriaki; Watanabe, Takashi*; Tanaka, Shigeo*; Ozawa, Osamu*; Komanome, Hirohisa*; Ueno, Shunji*; Tsuchiya, Kunihiko
Proceedings of 2017 IEEE Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC 2017) (Internet), 3 Pages, 2018/11
no abstracts in English
Watanabe, Takashi*; Ozawa, Osamu*; Takeuchi, Tomoaki
Denki Gakkai-Shi, 138(8), p.529 - 534, 2018/08
no abstracts in English
Watanabe, Takashi*; Takeuchi, Tomoaki; Ozawa, Osamu*; Komanome, Hirohisa*; Akahori, Tomoyuki*; Tsuchiya, Kunihiko
Proceedings of 2017 International Image Sensor Workshop (IISW 2017) (Internet), p.206 - 209, 2017/05
no abstracts in English
Takeuchi, Tomoaki; Otsuka, Noriaki; Tsuchiya, Kunihiko; Tanaka, Shigeo*; Ozawa, Osamu*; Komanome, Hirohisa*; Watanabe, Takashi*; Ueno, Shunji*
Nihon Hozen Gakkai Dai-13-Kai Gakujutsu Koenkai Yoshishu, p.391 - 394, 2016/07
no abstracts in English
Takeuchi, Tomoaki; Otsuka, Noriaki; Watanabe, Takashi*; Kamiyanagi, Tomohiro*; Komanome, Hirohisa*; Ueno, Shunji*; Tsuchiya, Kunihiko
Proceedings of Decommissioning and Remote Systems 2016 (D&RS 2016) (CD-ROM), p.263 - 264, 2016/07
In response to the lesson of the accident at the Fukushima Dai-ichi Nuclear Power Plant, we started a development of a radiation resistant monitoring camera system. In this study, improvement of radiation resistance of the imaging sensor was addressed as the main target. Three different types of CMOS image sensors with field plate structure and three transistors (3TPD), photogate structure and three (3TPG) or four transistors (4TPG) were designed and fabricated. The sensors were irradiated up to 70 kGy at the Co -ray irradiation facility at Takasaki Advanced Radiation Research Institute in Japan Atomic Energy Agency. After irradiation, the dark current of the 4TPG rapidly increased and excessed that of the 3T types at least by 50 kGy. The large increase of the dark current of the 4TPG resulted in almost no sensitivity at least by 50 kGy. On the other hand, the sensitivities of the 3T types remained usable values and 3TPG had larger sensitivity than 3TPD after 50 kGy. As the results, the 3TPG sensor was revealed to be the most advantageous one in terms of dark current and sensitivity among the fabricated three sensors.
Takeuchi, Tomoaki; Ueno, Shunji; Shibata, Hiroshi; Tsuchiya, Kunihiko; Kamiyanagi, Tomohiro*; Komanome, Hirohisa*; Watanabe, Takashi*
no journal, ,
no abstracts in English
Takeuchi, Tomoaki; Otsuka, Noriaki; Kamiyanagi, Tomohiro*; Watanabe, Takashi*; Komanome, Hirohisa*; Ueno, Shunji*; Tsuchiya, Kunihiko
no journal, ,
no abstracts in English
Takeuchi, Tomoaki; Tanaka, Shigeo*; Watanabe, Takashi*; Otsuka, Noriaki; Ozawa, Osamu*; Komanome, Hirohisa*; Ueno, Shunji*; Tsuchiya, Kunihiko
no journal, ,
no abstracts in English
Tanaka, Shigeo*; Ozawa, Osamu*; Watanabe, Takashi*; Takeuchi, Tomoaki; Otsuka, Noriaki; Ueno, Shunji*; Komanome, Hirohisa*; Tsuchiya, Kunihiko
no journal, ,
no abstracts in English
武内 伴照; 土谷 邦彦
上柳 智裕*; 渡辺 恭志*
A radiation tolerant optical detection element includes: a p-type base-body region; a gate insulating film provided on an upper surface of the base-body region; an n-type buried charge-generation region buried in an upper portion of the base-body region; an n-type charge-readout region buried in an upper portion of the base-body region on the inner-contour side of the buried charge-generation region; an n-type reset-drain region buried on the inner-contour side of the charge-readout region; a transparent electrode provided on the gate insulating film above the buried charge-generation region; and a reset-gate electrode provided on a portion of the gate insulating film between the charge-readout region and the reset-drain region.
武内 伴照; 土谷 邦彦
上柳 智裕*; 渡辺 恭志*
電圧感度が高く、且つ耐放射線特性を有する光検出素子及びこの光検出素子を画素とした固体撮像装置を提供する。P型の基体領域(11)と、基体領域(11)の上面に設けられたゲート絶縁膜(23)と、基体領域(11)の上部に埋め込まれたN型の電荷生成埋込領域(13)と、電荷生成埋込領域(13)の内径の基体領域(11)の上部に埋め込まれたN型の電荷読出領域(15i,j)と、電荷読出領域(15i,j)の内径側に埋め込まれたN型のリセットドレイン領域(16i,j)と、電荷生成埋込領域の上方となるゲート絶縁膜(23)上に設けられた透明電極(21i,j)と、電荷読出領域(15i,j)とリセットドレイン領域(16i,j)との間のゲート絶縁膜(23)上に設けられたリセットゲート電極(22i,j)とを備える。
武内 伴照; 土谷 邦彦
加藤 真一*; 渡辺 恭志*
【課題】放射線環境下においても、良好な画像を撮像可能な撮像装置を提供する。 【解決手段】撮像装置は画素がPG(フォトゲート)型CMOS撮像素子で構成された固体撮像部1と、撮像素子を遮光した状態で得られた電圧レベルに基づいて暗電流の検出をする暗電流検出手段2と、暗電流を検出した場合に、撮像素子のPG電圧を制御することにより暗電流を抑制するPG電圧制御手段6と、電流検出手段で暗電流を検出しなかった場合に、撮像素子を遮光しない状態で得られた電圧レベルに基づいて補正係数を決定する補正係数決定手段と、撮像素子のそれぞれから出力される電圧レベルを、決定した補正係数を用いて補正することによって、最終的に出力される映像信号の輝度階調を制御する輝度階調制御手段3とを備える。PG電圧制御手段は、PG電圧を所定値だけ変更したときに変動する飽和電荷量のレベルに応じたPG電圧に設定する。
武内 伴照; 土谷 邦彦
渡辺 恭志*; 田中 茂雄*
An optical-detection element includes a p-type supporting-layer, an n-type buried charge-generation region to implement a photodiode with the supporting-layer, a p-type shield region buried in the buried charge-generation region, a gate insulating-film contacted with the shield region, a transparent electrode on the gate insulating-film, a p-type well region buried in the supporting-layer, and an n+-type charge-readout region buried in the supporting-layer at an edge of the well region toward the buried charge-generation region.
武内 伴照
渡辺 恭志*; 駒野目 裕久*
【課題】電界集中を抑えつつ、半導体界面の空乏化抑制により暗電流抑圧を完全なものとする光検出素子を提供する。 【解決手段】P型の基体領域1と、基体領域1とP-N接合を構成するN型の電荷生成埋込層5と、電荷生成埋込層5に接したP型のシールド層6と、電荷生成埋込層5に接したN+型の電荷読出領域8と、シールド層6に接したフォトゲート絶縁膜4Bと、フォトゲート絶縁膜4Bの電荷読出領域8側の端部上に設けられたN型の緩和領域部14-1と、緩和領域部14-1に連続してフォトゲート絶縁膜4Bの上に設けられたP型の主透明電極層14-2を備える。主透明電極層14-2の電位がシールド層6の表面に及ぼす静電ポテンシャル効果により、シールド層6の表面にP型の電荷をピンニングする。