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Yamamoto, Kazami; Kinsho, Michikazu; Hayashi, Naoki; Saha, P. K.; Tamura, Fumihiko; Yamamoto, Masanobu; Tani, Norio; Takayanagi, Tomohiro; Kamiya, Junichiro; Shobuda, Yoshihiro; et al.
Journal of Nuclear Science and Technology, 59(9), p.1174 - 1205, 2022/09
Times Cited Count:6 Percentile:84.97(Nuclear Science & Technology)In the Japan Proton Accelerator Research Complex, the purpose of the 3 GeV rapid cycling synchrotron (RCS) is to accelerate a 1 MW, high-intensity proton beam. To achieve beam operation at a repetition rate of 25 Hz at high intensities, the RCS was elaborately designed. After starting the RCS operation, we carefully verified the validity of its design and made certain improvements to establish a reliable operation at higher power as possible. Consequently, we demonstrated beam operation at a high power, namely, 1 MW. We then summarized the design, actual performance, and improvements of the RCS to achieve a 1 MW beam.
Sato, Nobuaki*; Kirishima, Akira*; Watanabe, Masayuki; Sasaki, Takayuki*; Uehara, Akihiro*; Takeda, Shino*; Kitatsuji, Yoshihiro; Otobe, Haruyoshi; Kobayashi, Taishi*
The Chemistry of Thorium, Plutonium and MA, 254 Pages, 2022/03
The chemistry of nuclear materials such as Thorium (Part 1) and Plutonium (Part 2) was described in relation from the fundamentals on solid chemistry and solution chemistry to the practicals on the experiment and evaluation method in detail. Minor actinides such as Neptunium, Americium, Curium and Protoactinium, was introduced the basics on the solid and solution chemistry.
Watanabe, Hiroshi*; Watanabe, Yutaka*; Hirayama, Yoshikazu*; Andreyev, A. N.; Hashimoto, Takashi*; Kondev, F. G.*; Lane, G. J.*; Litvinov, Yu. A.*; Liu, J. J.*; Miyatake, Hiroari*; et al.
Physics Letters B, 814, p.136088_1 - 136088_6, 2021/03
Times Cited Count:4 Percentile:46.8(Astronomy & Astrophysics)Sato, Nobuaki*; Kirishima, Akira*; Watanabe, Masayuki; Sasaki, Takayuki*; Uehara, Akihiro*; Takeda, Shino*
Uran No Kagaku (II); Hoho To Jissen, 143 Pages, 2021/03
This book describes necessary facts when readers would have an opportunity to treat Uranium for experiments. In the content, the method section shows experimental facilities and equipment including method, and the practical section mentions solution and solid state experiments using Uranium and/or radioisotopes.
Chen, Z. Q.*; Li, Z. H.*; Hua, H.*; Watanabe, Hiroshi*; Yuan, C. X.*; Zhang, S. Q.*; Lorusso, G.*; Orlandi, R.; 60 of others*
Physical Review Letters, 122(21), p.212502_1 - 212502_6, 2019/05
Times Cited Count:20 Percentile:77.32(Physics, Multidisciplinary)Watanabe, Hiroshi*; Wang, H. K.*; Lorusso, G.*; Nishimura, Shunji*; Xu, Z. Y.*; Sumikama, Toshiyuki*; Orlandi, R.; 47 of others*
Physics Letters B, 792, p.263 - 268, 2019/05
Times Cited Count:6 Percentile:53.97(Astronomy & Astrophysics)Yamada, Takahiro*; Watanabe, Kenta*; Nozaki, Mikito*; Shih, H.-A.*; Nakazawa, Satoshi*; Anda, Yoshiharu*; Ueda, Tetsuzo*; Yoshigoe, Akitaka; Hosoi, Takuji*; Shimura, Takayoshi*; et al.
Japanese Journal of Applied Physics, 57(6S3), p.06KA07_1 - 06KA07_6, 2018/06
Times Cited Count:6 Percentile:30.01(Physics, Applied)Thermal oxidation of AlGaN surface and its impact on the electrical properties of AlGaN/GaN MOS capacitors were investigated by means of synchrotron radiation photoelectron spectroscopy (SR-PES), atomic force microscopy (AFM) and C-V measurements. SR-PES analysis revealed that the AlGaN surface is oxidized even at low temperature of 400C, in contrast to no oxide formation on GaN surface. However, since no noticeable change in the surface morphology was observed at temperatures up to 800C, it can be concluded that an ultrathin oxide overlayer is formed on the AlGaN surface. On the other hand, for the oxidation treatments above 850C, the formation of small oxide grains was observed over the entire area of the AlGaN surface, and the growth of oxide grains significantly degraded the surface morphology. Therefore, the AlGaN/GaN MOS capacitors were fabricated on the AlGaN surface oxidized at moderate temperatures up to 800C. While we have confirmed that relatively good interface properties are obtained for direct AlON deposition without oxidation treatment, it was found that the oxidation treatment at 400C leads to further improvement of interface properties and reduction of C-V hysteresis.
Watanabe, Kenta*; Terashima, Daiki*; Nozaki, Mikito*; Yamada, Takahiro*; Nakazawa, Satoshi*; Ishida, Masahiro*; Anda, Yoshiharu*; Ueda, Tetsuzo*; Yoshigoe, Akitaka; Hosoi, Takuji*; et al.
Japanese Journal of Applied Physics, 57(6S3), p.06KA03_1 - 06KA03_6, 2018/06
Times Cited Count:10 Percentile:45.99(Physics, Applied)The advantage of SiO/AlON stacked gate dielectrics over SiO, AlON and AlO single dielectric layers was demonstrated. Our systematic research revealed that the optimized stacked structure with 3.3-nm-thick AlON interlayer is beneficial in terms of superior interface quality, reduced gate leakage current and C-V hysteresis for next-generation high frequency and high power AlGaN/GaN MOS-HFETs.
Nozaki, Mikito*; Watanabe, Kenta*; Yamada, Takahiro*; Shih, H.-A.*; Nakazawa, Satoshi*; Anda, Yoshiharu*; Ueda, Tetsuzo*; Yoshigoe, Akitaka; Hosoi, Takuji*; Shimura, Takayoshi*; et al.
Japanese Journal of Applied Physics, 57(6S3), p.06KA02_1 - 06KA02_7, 2018/06
Times Cited Count:18 Percentile:65.6(Physics, Applied)We fabricated AlON dielectric films by repeating thin AlN deposition and in situ O oxidation for AlGaN/GaN MOS-HFETs. Uniform nitrogen distribution is achievable by the proposed ALD-based process and that nitrogen concentration can be precisely controlled by changing AlN thickness (ALD cycle number) in each step. It was found that AlON films grown by ALD system offers significant advantages in terms of practical application while keeping superior Vth stability and electrical properties at the insulator/AlGaN interface in AlGaN/GaN MOS-HFETs.
Yamada, Takahiro*; Watanabe, Kenta*; Nozaki, Mikito*; Yamada, Hisashi*; Takahashi, Tokio*; Shimizu, Mitsuaki*; Yoshigoe, Akitaka; Hosoi, Takuji*; Shimura, Takayoshi*; Watanabe, Heiji*
Applied Physics Express, 11(1), p.015701_1 - 015701_4, 2018/01
Times Cited Count:39 Percentile:84.89(Physics, Applied)A simple and feasible method for fabricating high-quality and highly reliable GaN-based metal-oxide-semiconductor (MOS) devices was developed on the basis of systematic physical and electrical characterizations. Chemical vapor deposition of SiO films directly onto GaN substrates forming Ga-oxide interlayers was used to fabricate SiO/GaO/GaN stacked structures. Although well-behaved hysteresis-free GaN-MOS capacitors with extremely low interface state density below 10cmeV were obtained by post-deposition annealing, Ga diffusion into overlying SiO layers severely degraded the insulating property and dielectric breakdown characteristics of the MOS devices. However, this problem was found to be solved by employing rapid thermal processing, leading to superior performance of the GaN-MOS devices in terms of interface quality, insulating property and gate dielectric reliability.
Watanabe, Kenta*; Nozaki, Mikito*; Yamada, Takahiro*; Nakazawa, Satoshi*; Anda, Yoshiharu*; Ishida, Masahiro*; Ueda, Tetsuzo*; Yoshigoe, Akitaka; Hosoi, Takuji*; Shimura, Takayoshi*; et al.
Applied Physics Letters, 111(4), p.042102_1 - 042102_5, 2017/07
Times Cited Count:16 Percentile:60.44(Physics, Applied)AlGaN/GaN HFET (hetero-junction field-effect transitor) has gained much attention as next-generation high frequency and high power devices. In this study, we systematically investigated the interface reaction between Al-based dielectrics (AlO and AlON) and AlGaN layer during deposition and post-deposition annealing (PDA), and revealed high thermal stability of AlON/AlGaN interface.
Yamada, Takahiro*; Ito, Joyo*; Asahara, Ryohei*; Watanabe, Kenta*; Nozaki, Mikito*; Nakazawa, Satoshi*; Anda, Yoshiharu*; Ishida, Masahiro*; Ueda, Tetsuzo*; Yoshigoe, Akitaka; et al.
Journal of Applied Physics, 121(3), p.035303_1 - 035303_9, 2017/01
Times Cited Count:66 Percentile:91.84(Physics, Applied)Initial oxidation of GaN(0001) epilayers and subsequent growth of thermal oxides in dry oxygen ambient were investigated by means of X-ray photoelectron spectroscopy, spectroscopic ellipsometry, atomic force microscopy and X-ray diffraction measurements. It was found that, whereas initial oxide formation tends to saturate at temperatures below 800C, selective growth of small oxide grains proceeds at dislocations in the epilayers, followed by noticeable grain growth leading to rough surface morphology at higher oxidation temperatures. This indicates that oxide growth and its morphology are crucially dependent on the defect density in the GaN epilayers. Structural characterizations also revealed that polycrystalline - and -phase GaO grains in an epitaxial relation with the GaN substrate are formed from the initial stage of the oxide growth. On the basis of these experimental findings, we also developed a comprehensive model for GaN oxidation mediated by nitrogen removal and mass transport.
Sakanaka, Shogo*; Akemoto, Mitsuo*; Aoto, Tomohiro*; Arakawa, Dai*; Asaoka, Seiji*; Enomoto, Atsushi*; Fukuda, Shigeki*; Furukawa, Kazuro*; Furuya, Takaaki*; Haga, Kaiichi*; et al.
Proceedings of 1st International Particle Accelerator Conference (IPAC '10) (Internet), p.2338 - 2340, 2010/05
Future synchrotron light source using a 5-GeV energy recovery linac (ERL) is under proposal by our Japanese collaboration team, and we are conducting R&D efforts for that. We are developing high-brightness DC photocathode guns, two types of cryomodules for both injector and main superconducting (SC) linacs, and 1.3 GHz high CW-power RF sources. We are also constructing the Compact ERL (cERL) for demonstrating the recirculation of low-emittance, high-current beams using above-mentioned critical technologies.
Wada, Atsushi*; Watanabe, Masayuki; Yamanoi, Yoshinori*; Nankawa, Takuya; Namiki, Kosuke*; Yamasaki, Mikio*; Murata, Masaki*; Nishihara, Hiroshi*
Bulletin of the Chemical Society of Japan, 80(2), p.335 - 345, 2007/02
Times Cited Count:22 Percentile:57.38(Chemistry, Multidisciplinary)Lanthanide complexes with linear and cyclic octadentate oligopyridine-amine ligands were synthesized, and their molecular structures were determined by single-crystal X-ray crystallography. All of the complexes had a distorted capped square antiprism (CSAP) geometry, and the coordination environments of lanthanide complexes were more distortedfor the complexes with the linear ligand than those with the cyclic ligand. The Eu complexes with the linear ligand showed more intense emissions, which were attributed to the D F transition, than the complex withthe cyclic ligand in acetonitrile, which can be attributed to the distortion in the coordination environments. These results indicate that the coordination environments of lanthanide complexes, and thus the luminescence properties, can be controlled by tuning the geometrical structures of polydentate ligands.
Watanabe, Masayuki; Nankawa, Takuya*; Yamada, Teppei*; Kimura, Takaumi; Namiki, Kosuke*; Murata, Masaki*; Nishihara, Hiroshi*; Tachimori, Shoichi
Inorganic Chemistry, 42(22), p.6977 - 6979, 2003/11
Times Cited Count:34 Percentile:75.29(Chemistry, Inorganic & Nuclear)A tripodal ligand, tris(2-pyridyl)carbinol affords a novel tetradentate coordination mode in homodinuclear lanthanide complexes, which exhibit remarkably short distance between the metal ions. Strong fluorescence of Eu(III) and Tb(III) complexes with the ligand demonstrate that the ligand has a suitable excited state for energy transfer from the ligand to Eu(III) and Tb(III) center.
Wada, Atsushi; Watanabe, Masayuki; Yamanoi, Yoshinori*; Murata, Masaki*; Nishihara, Hiroshi*
no journal, ,
Lanthanide complexes with linear and cyclic octadentate oligopyridine-amine ligands were newly synthesized, and their molecular structures were determined by single-crystal X-ray crystallography. All of the complexes formed with the distorted CSAP geometry, the symmetry of which was higher for the complexes with the cyclic ligand than those with the linear ligand. The Eu and Tb complexes showed intense luminescence due to energy transfer from the ligand to the metal center (antenna effect). The Eu complexes with the linear ligand showed more intense emissions attributed to the 5D07F2 transition than the complex with the cyclic ligand, which can be explained by the decrease in symmetry around the lanthanide ion. The coordination of water molecules to Eu and Tb ions was strongly inhibited by surrounding the metal ions with the cyclic ligand, resulting in an appearance of intense luminescence in water. These results indicate that the symmetry and stability of lanthanide complexes, and thus the luminescence properties, can be successfully controlled by tuning the geometrical structures of multi-dentate ligands.
Watanabe, Masayuki; Nankawa, Takuya; Wada, Atsushi*; Namiki, Kosuke*; Murata, Masaki*; Nishihara, Hiroshi*; Kimura, Takaumi
no journal, ,
A tripodal ligand, tris(2-pyridyl)carbinol affords a novel tetradentate coordination mode in homodinuclear lanthanide complexes, which exhibit remarkably short distances between metal ions. Structures of dinuclear complexes synthesized from triflates exhibited the same structure other than the difference in the bond lengths which was induced by lanthanide contraction across the lanthanide series from Pr to Lu. In these complexes, the distance between two lanthanide ions was remarkably short. In this study the same type of dinuclear complexes were synthesized from nitrates. The nitrate ion can coordinate in both monodentate fand bidentate fashions. Since ionic radii are dependent upon the coordination number, nitrate could affect the metal-metal distance. In fact, dinuclear complexes exhibited longer distance between lanthanide ions than the triflates due to the increase of ionic radii of lanthanide ions. Some features of these dinuclear systems, which are induced from the difference of metal-metal distance, will be discussed in the presentation.
Watanabe, Masayuki; Ishimori, Kenichiro; Wada, Atsushi*; Kataoka, Yumiko*; Murata, Masaki*; Shinoda, Satoshi*; Nishihara, Hiroshi*; Tsukube, Hiroshi*; Kimura, Takaumi
no journal, ,
Soft-donor extractants containing sulfur- or nitrogen-donor are applicable to the separation of trivalent actinides (An(III)) from lanthanides (Ln(III)) by solvent extraction method. We designed two ligand systems which are expected to efficiently separate An(III) from Ln(III). The one is "Oligo-pyridine" ligand containing multiple pyridine moieties. The other is "Chirality-controlled" ligand containing chiral centers in the ligand. We synthesized more than thirty ligands and found out the ability on the separation of An(III) from Ln(III). In this presentation, we will discuss about the comprehensive results on the separation ability of An(III) from Ln(III) by means of "Oligo-pyridine" and "Chirality-controlled" ligands, and the extraction equilibrium of An(III) with selected tripodal ligands in detail.
Yamada, Takahiro*; Yoshigoe, Akitaka; Ito, Joyo*; Asahara, Ryohei*; Watanabe, Kenta*; Nozaki, Mikito*; Nakazawa, Satoshi*; Anda, Yoshiharu*; Ishida, Masahiro*; Ueda, Tetsuzo*; et al.
no journal, ,
Thermal oxidation process of self-standing GaN (ss-GaN) substrates with low-defect density were investigated by atomic force microscopy and synchrotron radiation photoelectron spectroscopy. ss-GaN sample showed a flat surface morphology without pits which are ascribed to dislocation defects in the measured area (1 mx1 m). Therefore, the preferential formation of Ga-oxides at the pits was not observed by thermal oxidation, and the flat surface morphology was kept in the sample oxidized at 800C (the root-mean-square (RMS) roughness of 0.14 nm). However, the ss-GaN sample oxidized at 900C showed rough surface morphology due to the formation of small Ga-oxide grains (RMS roughness of 0.62 nm). The grains drastically grew at 1000C, resulted in the surface morphology consisting of -GaO crystal.
Yamada, Takahiro*; Watanabe, Kenta*; Nozaki, Mikito*; Yoshigoe, Akitaka; Hosoi, Takuji*; Shimura, Takayoshi*; Watanabe, Heiji*
no journal, ,
Interface properties of SiO/GaN structure with post-oxidation treatment were investigated by synchrotron radiation photoelectron spectroscopy and C-V measurements. High-resolution Ga 2p core-level spectra for SiO/GaN structure oxidized at 800 degrees showed asymmetric feature with a shoulder at higher binding energies compared to that for wet-cleaned GaN surface. From peak deconvolution of the Ga2p spectrum, formation of GaOx layer at the SiO/GaN interface was revealed. C-V measurements of the SiO/GaOx/GaN MOS capacitor exhibited apparently low frequency dispersion and a small hysteresis of below 50 mV. Moreover, the C-V curves well agreed with an ideal C-V curve. These results indicate that good interface properties were achieved by the interfacial GaOx formation.