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Oral presentation

Photoluminescence properties of light-emitting SiO$$_{2}$$ substrates implanted with Si and C ions

Inada, Kazuki*; Kawashima, Akihiro*; Kano, Keisuke*; Noguchi, Katsuya*; Miura, Kenta*; Hanaizumi, Osamu*; Yamamoto, Shunya; Kawaguchi, Kazuhiro*; Yoshikawa, Masahito

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It is reported that Si and C ions implanted SiO$$_{2}$$ substrates emit blue light. In this paper, we are studying photoluminescence (PL) properties of SiO$$_{2}$$ substrates implanted with Si and C ions on various conditions. Si and C ions were implanted into an SiO$$_{2}$$ substrate by using a 400-kV ion implanter at JAEA/Takasaki. The Si-ion implantation energy was 150 keV, and the implantation dose was $$sim$$5.0$$times$$10$$^{16}$$ ions/cm$$^{2}$$. The C-ion implantation energy was 75 keV, and the implantation dose was $$sim$$3.0$$times$$10$$^{16}$$ ions/cm$$^{2}$$. The samples were subsequently annealed at 700$$^{circ}$$C for 25 min in air, after 1000$$^{circ}$$C for 25 min in air. The results of PL measurements show that the PL peak wavelength became shorter by increasing the ratio of C ions to Si ions. Consequently, it was confirmed that the emission wavelength can be controlled by hanging the ratio of C and Si.

Oral presentation

Fabrication of Mach-Zehnder optical waveguide structures in PDMS thin films using proton beam writing

Kano, Keisuke*; Saruya, Ryota*; Kawabata, Shunsuke*; Araki, Jun*; Noguchi, Katsuya*; Kada, Wataru*; Miura, Kenta*; Kato, Hijiri*; Sato, Takahiro; Koka, Masashi; et al.

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