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Kitamura, Akane; Yamaki, Tetsuya*; Yuri, Yosuke*; Koshikawa, Hiroshi*; Sawada, Shinichi*; Yuyama, Takahiro*; Usui, Aya; Chiba, Atsuya*
Nuclear Instruments and Methods in Physics Research B, 460, p.254 - 258, 2019/12
Times Cited Count：2 Percentile：23.19(Instruments & Instrumentation)Poly(vinylidene-fluoride) (PVDF) film is suitable for investigation of the size of etchable ion tracks because we can clearly judge the finish of the track etching and the surrounding bulk area remains due to the high chemical stability. Thereby we can measure the radius of ion tracks of each ion. In this study, we focused on two irradiation conditions for controlling the size of etchable ion tracks of PVDF films. One was irradiation in an oxygen atmosphere and the other was a fullerene (C
) cluster beam irradiation. SEM observation showed that the size of pores became larger by irradiation in an oxygen atmosphere. It was found that the oxidation of ion tracks widened the size of etchable ion tracks. The C irradiation caused larger etchable tracks on the PVDF surface. The result could represent the effect of local and simultaneous collisions by the swift aggregated ions.
cluster ionsKitamura, Akane; Yamaki, Tetsuya*; Chiba, Atsuya*; Usui, Aya
QST-M-8; QST Takasaki Annual Report 2016, P. 37, 2018/03
We investigated the track-etched surface of PVDF films irradiated with C cluster ions, comparing the data with C monoatomic ions. PVDF films were irradiated with 6 MeV C cluster ions. The energy of the each carbon ion is 100 keV/atom; thus, for comparison, the PVDF films were also irradiated with 100 keV C ions. SEM and AFM observation showed that the surface irradiated with C cluster ions apparently possessed flat-bottomed pores with an average diameter and depth of approximately 400 and 250 nm, respectively. On the other hand, track-etched pores were also formed on the surface irradiated with C ions, but their morphology was irregular or obscure. In the irradiation with the C cluster ions, the surface diameter of track-etched pores increased with increasing the etching time. The tracks of the 100 keV C ions seemed to be hardly developed by the etching when the time. In conclusion, the C cluster ions irradiation caused a large size of etchable tracks on the PVDF surface. The result could represent the effect of local and simultaneous collision by the aggregated ions.
ion production by electron attachment using cesium sputter ion sourceUsui, Aya; Chiba, Atsuya; Yamada, Keisuke
JAEA-Technology 2016-034, 21 Pages, 2017/03
JAEA-Technology-2016-034.pdf:82.52MB
In the TIARA (Takasaki Ion Accelerators for Advanced Radiation Application), in order to propel the studies on the swift cluster ions, a novel technique was developed to increase the beam intensity of the fullerene ions which would have a considerably larger irradiation effect than any cluster ions. As a new method of negative ion production, the ionization mechanism by electron attachment was introduced as an alternative to the traditional method with the cesium sputtering to the existing cesium sputter type ion source (SNICS). In consequence, the intensity of the negative C ion beam produced using an existing ion source with a novel technique was increased thousand times as high as those using the previous one for 12 hour operation. In this report, we describe the problems in the traditional ionization method and explain the production technique of the negative C ions ionized via electron attachment process, which solves that only by the minor changes in SNICS.
Usui, Aya; Chiba, Atsuya; Yamada, Keisuke; Yokoyama, Akihito; Kitano, Toshihiko*; Takayama, Terumitsu*; Orimo, Takao*; Kanai, Shinji*; Aoki, Yuki*; Hashizume, Masashi*; et al.
Dai-28-Kai Tandemu Kasokuki Oyobi Sono Shuhen Gijutsu No Kenkyukai Hokokushu, p.117 - 119, 2015/12
no abstracts in English
Chiba, Atsuya; Usui, Aya; Yamada, Keisuke
Dai-28-Kai Tandemu Kasokuki Oyobi Sono Shuhen Gijutsu No Kenkyukai Hokokushu, p.53 - 56, 2015/12
no abstracts in English
Yuyama, Takahiro; Ishibori, Ikuo; Kurashima, Satoshi; Yoshida, Kenichi; Ishizaka, Tomohisa; Chiba, Atsuya; Yamada, Keisuke; Yokoyama, Akihito; Usui, Aya; Miyawaki, Nobumasa; et al.
Proceedings of 12th Annual Meeting of Particle Accelerator Society of Japan (Internet), p.302 - 304, 2015/09
no abstracts in English
Chiba, Atsuya; Usui, Aya; Yamada, Keisuke
Dai-27-Kai Tandemu Kasokuki Oyobi Sono Shuhen Gijutsu No Kenkyukai Hokokushu, p.56 - 59, 2015/03
Utilization of the swift fullerene ion beam in TIARA using the tandem accelerator tends to increase year after year. However, only a few currents obtained by a generating method of negative ions with a cesium sputtering is hindrance to the progress of study. A generating method of the negative fullerene ions is developed on the basis of an electron attachment. As a result, the method permits us to obtain stable beam intensity more than a thousand-fold compared with that produced by the sputtering method.
Usui, Aya; Uno, Sadanori; Chiba, Atsuya; Yamada, Keisuke; Yokoyama, Akihito; Kitano, Toshihiko*; Takayama, Terumitsu*; Orimo, Takao*; Kanai, Shinji*; Aoki, Yuki*; et al.
Dai-27-Kai Tandemu Kasokuki Oyobi Sono Shuhen Gijutsu No Kenkyukai Hokokushu, p.118 - 121, 2015/03
no abstracts in English
Yamada, Keisuke; Saito, Yuichi; Ishii, Yasuyuki; Matoba, Shiro; Chiba, Atsuya; Yokoyama, Akihito; Usui, Aya; Sato, Takahiro; Okubo, Takeru; Uno, Sadanori
JAEA-Review 2013-059, JAEA Takasaki Annual Report 2012, P. 159, 2014/03
no abstracts in English
Uno, Sadanori; Chiba, Atsuya; Yamada, Keisuke; Yokoyama, Akihito; Usui, Aya; Saito, Yuichi; Ishii, Yasuyuki; Sato, Takahiro; Okubo, Takeru; Nara, Takayuki; et al.
JAEA-Review 2013-059, JAEA Takasaki Annual Report 2012, P. 179, 2014/03
Three electrostatic accelerators at TIARA were operated on schedule in fiscal year 2012 except changing its schedule by cancellations of users. The yearly operation time of the 3 MV tandem accelerator, the 400 kV ion implanter and the 3MV single-ended accelerator were in the same levels as the ordinary one, whose operation time totaled to 2,073, 1,847 and 2,389 hours, respectively. The tandem accelerator had no trouble, whereas the ion implanter and the single-ended accelerator stopped by any troubles for one day and four days, respectively. The molecular ion beam of helium hydride was generated by the ion implanter, because the users required irradiation of several cluster ions in order to study the effect of irradiation. As a result, its intensity of beam was 50 nA at 200 kV. The ion beam of tungsten (W) at 15 MeV was accelerated by the tandem accelerator, whose intensity was 20 nA at charge state of 4+, because of the request from a researcher in the field of nuclear fusion.
Uno, Sadanori; Chiba, Atsuya; Yamada, Keisuke; Yokoyama, Akihito; Usui, Aya; Kitano, Toshihiko*; Takayama, Terumitsu*; Orimo, Takao*; Kanai, Shinji*; Aoki, Yuki*; et al.
Dai-26-Kai Tandemu Kasokuki Oyobi Sono Shuhen Gijutsu No Kenkyukai Hokokushu, p.79 - 81, 2013/07
Three electrostatic accelerators at TIARA were operated on schedule in fiscal year 2012 except changing its schedule by cancellations of users. The yearly operation time of the 3MV tandem accelerator, the 400 kV ion implanter and the 3 MV single-ended accelerator were in the same levels as the ordinary one, whose operation time totaled to 2,073, 1,847 and 2,389 hours, respectively. The tandem accelerator had no trouble, whereas the ion implanter and the single-ended accelerator stopped by any troubles for one day and four days, respectively. The ion implanter generated molecular ion beam of helium hydride by using the Freeman type ion source, because of the request from the user. As a result, its intensity of beam was 50 nA at 200 kV.
Yamada, Keisuke; Saito, Yuichi; Ishii, Yasuyuki; Matoba, Shiro; Chiba, Atsuya; Yokoyama, Akihito; Usui, Aya; Sato, Takahiro; Okubo, Takeru; Uno, Sadanori
no journal, ,
no abstracts in English
ions through a tandem acceleratorSaito, Yuichi; Chiba, Atsuya; Usui, Aya; Yamada, Keisuke; Narumi, Kazumasa
no journal, ,
no abstracts in English
Saito, Yuichi; Chiba, Atsuya; Usui, Aya; Yamada, Keisuke; Matoba, Shiro; Narumi, Kazumasa
no journal, ,
Yamada, Keisuke; Saito, Yuichi; Ishii, Yasuyuki; Matoba, Shiro; Chiba, Atsuya; Yokoyama, Akihito; Usui, Aya; Sato, Takahiro; Okubo, Takeru; Uno, Sadanori
no journal, ,
no abstracts in English
