JOPSS - Search Results

Journal Articles

Development of embedded Mach-Zehnder optical waveguide structures in polydimethylsiloxane thin films by proton beam writing

Kada, Wataru*; Miura, Kenta*; Kato, Hijiri*; Saruya, Ryota*; Kubota, Atsushi*; Sato, Takahiro; Koka, Masashi; Ishii, Yasuyuki; Kamiya, Tomihiro; Nishikawa, Hiroyuki*; et al.

Nuclear Instruments and Methods in Physics Research B, 348, p.218 - 222, 2015/04

https://doi.org/10.1016/j.nimb.2014.12.041

Times Cited Count：6 Percentile：45.92(Instruments & Instrumentation)

Journal Articles

Electroplating of Ni microstructures on the cross section of Cu wire using PMMA mother fabricated by proton beam writing

Tanabe, Yusuke*; Iwamoto, Takashi*; Takahashi, Junichi*; Nishikawa, Hiroyuki*; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro

JAEA-Review 2012-046, JAEA Takasaki Annual Report 2011, P. 129, 2013/01

https://doi.org/10.11484/jaea-review-2012-046

Journal Articles

Visualization of focused proton beam dose distribution by atomic force microscopy using blended polymer films based on polyacrylic acid

Omichi, Masaaki*; Takano, Katsuyoshi*; Sato, Takahiro; Kamiya, Tomihiro; Ishii, Yasuyuki; Okubo, Takeru; Koka, Masashi; Kada, Wataru; Sugimoto, Masaki; Nishikawa, Hiroyuki*; et al.

Journal of Nanoscience and Nanotechnology, 12, p.7401 - 7404, 2012/09

https://doi.org/10.1166/jnn.2012.6457

Times Cited Count：2 Percentile：11.57(Chemistry, Multidisciplinary)

Journal Articles

Microprocessing of arched bridge structures with epoxy resin by proton beam writing

Takano, Katsuyoshi*; Asano, Atsushi*; Maeyoshi, Yuta*; Marui, Hiromi*; Omichi, Masaaki*; Saeki, Akinori*; Seki, Shu*; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro; et al.

Journal of Photopolymer Science and Technology, 25(1), p.43 - 46, 2012/07

https://doi.org/10.2494/photopolymer.25.43

Times Cited Count：2 Percentile：6.57(Polymer Science)

Journal Articles

Fabrication of concave and convex structure array consisted of epoxy long-nanowires by light and heavy ion beams lithography

Takano, Katsuyoshi*; Sugimoto, Masaki; Asano, Atsushi*; Maeyoshi, Yuta*; Marui, Hiromi*; Omichi, Masaaki*; Saeki, Akinori*; Seki, Shu*; Sato, Takahiro; Ishii, Yasuyuki; et al.

Transactions of the Materials Research Society of Japan, 37(2), p.237 - 240, 2012/06

https://doi.org/10.14723/tmrsj.37.237

Journal Articles

Fabrication of poly(9,9'-dioctylfluorene)-based nano- and microstructures by proton beam writing

Maeyoshi, Yuta*; Takano, Katsuyoshi*; Asano, Atsushi*; Marui, Hiromi*; Omichi, Masaaki*; Sato, Takahiro; Kamiya, Tomihiro; Ishii, Yasuyuki; Okubo, Takeru; Koka, Masashi; et al.

Japanese Journal of Applied Physics, 51(4R), p.045201_1 - 045201_4, 2012/04

https://doi.org/10.1143/JJAP.51.045201

Times Cited Count：1 Percentile：4.43(Physics, Applied)

Journal Articles

3D micro-fabrication utilized superimposing technique with focused MeV ion beams

Takano, Katsuyoshi*; Sato, Takahiro; Kamiya, Tomihiro; Ishii, Yasuyuki; Okubo, Takeru; Koka, Masashi; Kada, Wataru; Sugimoto, Masaki; Seki, Shuhei*; Nishikawa, Hiroyuki*

JAEA-Review 2011-043, JAEA Takasaki Annual Report 2010, P. 162, 2012/01

https://doi.org/10.11484/jaea-review-2011-043

Journal Articles

Electroforming of Ni mold using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

Tanabe, Yusuke*; Nishikawa, Hiroyuki*; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro

JAEA-Review 2011-043, JAEA Takasaki Annual Report 2010, P. 163, 2012/01

https://doi.org/10.11484/jaea-review-2011-043

Journal Articles

Fabrication of polymer optical waveguides for the 1.5-m band using focused proton beam

Miura, Kenta*; Machida, Yuki*; Uehara, Masato*; Kiryu, Hiromu*; Ozawa, Yusuke*; Sasaki, Tomoyuki*; Hanaizumi, Osamu*; Sato, Takahiro; Ishii, Yasuyuki; Koka, Masashi; et al.

Key Engineering Materials, 497, p.147 - 150, 2012/00

https://doi.org/10.4028/www.scientific.net/KEM.497.147

Times Cited Count：7 Percentile：95.12(Engineering, Electrical & Electronic)

Journal Articles

Fabrication of polymer optical waveguides for the 1.5-m band using focused proton beam

Miura, Kenta*; Machida, Yuki*; Uehara, Masato*; Kiryu, Hiromu*; Ozawa, Yusuke*; Sasaki, Tomoyuki*; Hanaizumi, Osamu*; Sato, Takahiro; Ishii, Yasuyuki; Koka, Masashi; et al.

Key Engineering Materials, 497, p.147 - 150, 2011/12

https://doi.org/10.4028/www.scientific.net/KEM.497.147

Times Cited Count：6 Percentile：2.48

Journal Articles

Microbeam complex at TIARA; Technologies to meet a wide range of applications

Kamiya, Tomihiro; Takano, Katsuyoshi; Sato, Takahiro; Ishii, Yasuyuki; Nishikawa, Hiroyuki*; Seki, Shu*; Sugimoto, Masaki; Okumura, Susumu; Fukuda, Mitsuhiro*

Nuclear Instruments and Methods in Physics Research B, 269(20), p.2184 - 2188, 2011/10

https://doi.org/10.1016/j.nimb.2011.02.043

Times Cited Count：15 Percentile：73.97(Instruments & Instrumentation)

Journal Articles

Nano-micro processing of epoxy resin systems by ion beam lithography with multiple energies and species

Takano, Katsuyoshi; Sato, Takahiro; Ishii, Yasuyuki; Koka, Masashi; Kamiya, Tomihiro; Okubo, Takeru; Sugimoto, Masaki; Nishikawa, Hiroyuki*; Seki, Shu*

Transactions of the Materials Research Society of Japan, 36(3), p.305 - 308, 2011/09

https://doi.org/10.14723/tmrsj.36.305

Journal Articles

Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

Tanabe, Yusuke*; Nishikawa, Hiroyuki*; Seki, Yoshihiro*; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro; Watanabe, Toru*; Sekiguchi, Atsushi*

Microelectronic Engineering, 88(8), p.2145 - 2148, 2011/08

https://doi.org/10.1016/j.mee.2011.01.019

Times Cited Count：9 Percentile：47.34(Engineering, Electrical & Electronic)

Journal Articles

Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing

Shiine, Yasuharu*; Nishikawa, Hiroyuki*; Furuta, Yusuke*; Kanamitsu, Kaoru*; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro; Nakao, Ryota*; Uchida, Satoshi*

Microelectronic Engineering, 87(5-8), p.835 - 838, 2010/05

https://doi.org/10.1016/j.mee.2009.12.071

Times Cited Count：7 Percentile：42.49(Engineering, Electrical & Electronic)

Journal Articles

Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA

Kamiya, Tomihiro; Takano, Katsuyoshi; Ishii, Yasuyuki; Sato, Takahiro; Oikawa, Masakazu*; Okubo, Takeru; Haga, Junji*; Nishikawa, Hiroyuki*; Furuta, Yusuke*; Uchiya, Naoyuki*; et al.

Nuclear Instruments and Methods in Physics Research B, 267(12-13), p.2317 - 2320, 2009/06

https://doi.org/10.1016/j.nimb.2009.03.043

Times Cited Count：7 Percentile：47.15(Instruments & Instrumentation)

Journal Articles

Development of micromachining technology in ion microbeam system at TIARA, JAEA

Kamiya, Tomihiro; Nishikawa, Hiroyuki*; Sato, Takahiro; Haga, Junji; Oikawa, Masakazu*; Ishii, Yasuyuki; Okubo, Takeru; Uchiya, Naoyuki; Furuta, Yusuke*

Applied Radiation and Isotopes, 67(3), p.488 - 491, 2009/03

https://doi.org/10.1016/j.apradiso.2008.06.021

Times Cited Count：4 Percentile：30.49(Chemistry, Inorganic & Nuclear)

Development of a mask-less ion beam lithography technique for fabricating micro- or nano-meter sized structures has been started at the microbeam systems in the ion accelerator facility of JAEA Takasaki (TIARA) in collaboration with Shibaura Institute of Technology. In order to obtain a high precision measure for microbeam size estimation and lens system optimization, or for improvement of spatial resolution down to 100 nm level, we applied this lithography technique itself combined with the electroplating process to make a Ni relief pattern as an optimum resolution standard to be used in secondary electron imaging. In this work, using this standard, the smallest beam size could be obtained. This paper also discuses on the scattering of ions in the materials influenced to the resolution using a Monte Carlo simulation code.

Journal Articles

Ni electroplating on a resist micro-machined by proton beam writing

Uchiya, Naoyuki*; Furuta, Yusuke*; Nishikawa, Hiroyuki*; Watanabe, Toru*; Haga, Junji; Sato, Takahiro; Oikawa, Masakazu; Ishii, Yasuyuki; Kamiya, Tomihiro

Microsystem Technologies, 14(9-11), p.1537 - 1540, 2008/10

https://doi.org/10.1007/s00542-007-0549-0

Times Cited Count：17 Percentile：64.34(Engineering, Electrical & Electronic)

Journal Articles

Evaluation of three dimensional microstructures on silica glass fabricated by ion microbeam

Nishikawa, Hiroyuki*; Souno, T.*; Hattori, M.*; Oki, Y.*; Watanabe, E.*; Oikawa, Masakazu*; Arakawa, Kazuo; Kamiya, Tomihiro

JAERI-Review 2003-033, TIARA Annual Report 2002, p.254 - 256, 2003/11

https://doi.org/10.11484/jaeri-review-2003-033

no abstracts in English

Journal Articles

Radiation effects and surface deformation of silica by ion microbeam

Nishikawa, Hiroyuki*; Souno, T.*; Hattori, M.*; Nishihara, Y.*; Oki, Y.*; Watanabe, E.*; Oikawa, Masakazu*; Kamiya, Tomihiro; Arakawa, Kazuo

Nuclear Instruments and Methods in Physics Research B, 191(1-4), p.342 - 345, 2002/05

https://doi.org/10.1016/S0168-583X(02)00530-X

Times Cited Count：3 Percentile：24.4(Instruments & Instrumentation)

no abstracts in English

Journal Articles

Gamma-ray-induced loss of Er $^{3+}$ -doped silica-core optical fiber

*; *; *; *; Kusama, Yasuo; Seguchi, Tadao

Japanese Journal of Applied Physics, 33(7A), p.3937 - 3941, 1994/07

https://doi.org/10.1143/JJAP.33.3937

Times Cited Count：2 Percentile：17.88(Physics, Applied)

no abstracts in English

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Development of embedded Mach-Zehnder optical waveguide structures in polydimethylsiloxane thin films by proton beam writing

Electroplating of Ni microstructures on the cross section of Cu wire using PMMA mother fabricated by proton beam writing

Visualization of focused proton beam dose distribution by atomic force microscopy using blended polymer films based on polyacrylic acid

Microprocessing of arched bridge structures with epoxy resin by proton beam writing

Fabrication of concave and convex structure array consisted of epoxy long-nanowires by light and heavy ion beams lithography

Fabrication of poly(9,9'-dioctylfluorene)-based nano- and microstructures by proton beam writing

3D micro-fabrication utilized superimposing technique with focused MeV ion beams

Electroforming of Ni mold using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

Fabrication of polymer optical waveguides for the 1.5-m band using focused proton beam

Fabrication of polymer optical waveguides for the 1.5-m band using focused proton beam

Microbeam complex at TIARA; Technologies to meet a wide range of applications

Nano-micro processing of epoxy resin systems by ion beam lithography with multiple energies and species

Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing

Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA

Development of micromachining technology in ion microbeam system at TIARA, JAEA

Ni electroplating on a resist micro-machined by proton beam writing

Evaluation of three dimensional microstructures on silica glass fabricated by ion microbeam

Radiation effects and surface deformation of silica by ion microbeam

Gamma-ray-induced loss of Er $^{3+}$ -doped silica-core optical fiber