Development of a negative hydrogen ion source for spatial beam profile measurement of a high intensity positive ion beam

Shinto, Katsuhiro; Wada, Motoi*; Nishida, Tomoaki*; Demura, Yasuhiro*; Sasaki, Daichi*; Tsumori, Katsuyoshi*; Nishiura, Masaki*; Kaneko, Osamu*; Kisaki, Masashi*; Sasao, Mamiko*

AIP Conference Proceedings 1390, p.675 - 683, 2011/09

https://doi.org/10.1063/1.3637440

Development of a beam profile monitor using a negative ion probe beam for high intensity positive ion beams

Shinto, Katsuhiro; Wada, Motoi*; Nishida, Tomoaki*; Kisaki, Masashi*; Tsumori, Katsuyoshi*; Nishiura, Masaki*; Kaneko, Osamu*; Sasao, Mamiko*

no journal, , 

We have proposed a negative ion beam probe system as a new scheme to diagnose beam profiles of high power positive ion beams. We show the present status of the proof-of-principle experiment for the negative ion beam probe system performed at NIFS NBI test stand. A negative hydrogen ion source which produces a rectangular shape beam was installed at the diagnostic chamber in the NBI test stand and the total current of H beam extracted from the ion source was measured. We obtained the total H beam current of 10 A with the beam energy of 3 kV.