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-implanted 6H-SiC studied by monoenergetic positron beamsUedono, Akira*; Tanigawa, Shoichiro*; Oshima, Takeshi; Ito, Hisayoshi; Yoshikawa, Masahito; Nashiyama, Isamu; Frank, T.*; Pensl, G.*; Suzuki, Ryoichi*; Odaira, Toshiyuki*; et al.
Journal of Applied Physics, 87(9), p.4119 - 4125, 2000/05
Times Cited Count：12 Percentile：49.24(Physics, Applied)no abstracts in English
Oshima, Takeshi; Uedono, Akira*; Ito, Hisayoshi; Yoshikawa, Masahito; Kojima, Kazutoshi; Okada, Sohei; Nashiyama, Isamu; Abe, Koji*; Tanigawa, Shoichiro*; Frank, T.*; et al.
Materials Science Forum, 338-342, p.857 - 860, 2000/00
no abstracts in English
Oshima, Takeshi; Ito, Hisayoshi; Uedono, Akira*; Suzuki, Ryoichi*; Ishida, Yuki*; Takahashi, Tetsuo*; Yoshikawa, Masahito; Kojima, Kazutoshi; Odaira, Toshiyuki*; Nashiyama, Isamu; et al.
Denshi Gijutsu Sogo Kenkyujo Iho, 62(10-11), p.469 - 476, 1999/00
no abstracts in English
Ito, Hisayoshi; Kawasuso, Atsuo; Oshima, Takeshi; Yoshikawa, Masahito; Nashiyama, Isamu; Okada, Sohei; Tanigawa, Shoichiro*; Okumura, Hajime*; Yoshida, Sadafumi*
Denshi Gijutsu Sogo Kenkyujo Iho, 62(10-11), p.23 - 29, 1999/00
no abstracts in English
-implanted 6H-SiC studied by monoenergetic positron beamsUedono, Akira*; Tanigawa, Shoichiro*; Oshima, Takeshi; Ito, Hisayoshi; Aoki, Yasushi; Yoshikawa, Masahito; Nashiyama, Isamu
Journal of Applied Physics, 86(10), p.5392 - 5398, 1999/00
Times Cited Count：10 Percentile：45.95(Physics, Applied)no abstracts in English
Uedono, Akira*; *; Morishita, Norio; Ito, Hisayoshi; Tanigawa, Shoichiro*; Fujii, Satoshi*; *
Journal of Physics; Condensed Matter, 11(25), p.4925 - 4934, 1999/00
Times Cited Count：12 Percentile：57.04(Physics, Condensed Matter)no abstracts in English
Uedono, Akira*; Fujii, Satoshi*; Morishita, Norio; Ito, Hisayoshi; Tanigawa, Shoichiro*; *
Journal of Physics; Condensed Matter, 11(20), p.4109 - 4122, 1999/00
Times Cited Count：9 Percentile：48.87(Physics, Condensed Matter)no abstracts in English
Suzuki, Ryoichi*; *; Uedono, Akira*; Y.K.Cho*; Yoshida, Sadafumi*; Ishida, Yuki*; Oshima, Takeshi; Ito, Hisayoshi; *; Mikado, Tomohisa*; et al.
Japanese Journal of Applied Physics, Part 1, 37(8), p.4636 - 4643, 1998/08
Times Cited Count：28 Percentile：74.39(Physics, Applied)no abstracts in English
-implanted 6H-SiC using monoenergetic positron beamsUedono, Akira*; Oshima, Takeshi; Ito, Hisayoshi; Suzuki, Ryoichi*; *; Tanigawa, Shoichiro*; Aoki, Yasushi; Yoshikawa, Masahito; Nashiyama, Isamu; Mikado, Tomohisa*
Japanese Journal of Applied Physics, Part 1, 37(5A), p.2422 - 2429, 1998/05
Times Cited Count：13 Percentile：53.56(Physics, Applied)no abstracts in English
Oshima, Takeshi; Uedono, Akira*; Abe, Koji*; Ito, Hisayoshi; Aoki, Yasushi; Yoshikawa, Masahito; Tanigawa, Shoichiro*; Nashiyama, Isamu
Applied Physics A, 67(4), p.407 - 412, 1998/00
Times Cited Count：26 Percentile：72.54(Materials Science, Multidisciplinary)no abstracts in English
Oshima, Takeshi; Uedono, Akira*; Ito, Hisayoshi; Abe, Koji*; Suzuki, Ryoichi*; *; Aoki, Yasushi; Tanigawa, Shoichiro*; Yoshikawa, Masahito; Mikado, Tomohisa*; et al.
Mater. Sci. Forum, 264-268, p.745 - 748, 1998/00
no abstracts in English
Ito, Hisayoshi; Oshima, Takeshi; Aoki, Yasushi; Abe, Koji*; Yoshikawa, Masahito; Nashiyama, Isamu; Okumura, Hajime*; Yoshida, Sadafumi*; Uedono, Akira*; Tanigawa, Shoichiro*
Journal of Applied Physics, 82(11), p.5339 - 5347, 1997/12
Times Cited Count：13 Percentile：57.44(Physics, Applied)no abstracts in English
Uedono, Akira*; Ito, Hisayoshi; Oshima, Takeshi; Suzuki, Ryoichi*; *; Tanigawa, Shoichiro*; Aoki, Yasushi; Yoshikawa, Masahito; Nashiyama, Isamu; Mikado, Tomohisa*; et al.
Japanese Journal of Applied Physics, Part 1, 36(11), p.6650 - 6660, 1997/11
Times Cited Count：16 Percentile：63.26(Physics, Applied)no abstracts in English
Ito, Hisayoshi; Uedono, Akira*; Oshima, Takeshi; Aoki, Yasushi; Yoshikawa, Masahito; Nashiyama, Isamu; Tanigawa, Shoichiro*; Okumura, Hajime*; Yoshida, Sadafumi*
Applied Physics A, 65(3), p.315 - 323, 1997/00
Times Cited Count：16 Percentile：63.26(Materials Science, Multidisciplinary)no abstracts in English
Ito, Hisayoshi; Kawasuso, Atsuo; Oshima, Takeshi; Yoshikawa, Masahito; Nashiyama, Isamu; Tanigawa, Shoichiro*; *; Okumura, Hajime*; Yoshida, Sadafumi*
Physica Status Solidi (A), 162, p.173 - 198, 1997/00
Times Cited Count：132 Percentile：97.83(Materials Science, Multidisciplinary)no abstracts in English
Uedono, Akira*; Ito, Hisayoshi; Oshima, Takeshi; Aoki, Yasushi; Yoshikawa, Masahito; Nashiyama, Isamu; Okumura, Hajime*; Yoshida, Sadafumi*; *; *; et al.
Japanese Journal of Applied Physics, Part 1, 35(12A), p.5986 - 5990, 1996/12
no abstracts in English
Uedono, Akira*; *; *; *; *; Ito, Hisayoshi
Journal of Physics; Condensed Matter, 7, p.5139 - 5149, 1995/00
Times Cited Count：10 Percentile：55.08(Physics, Condensed Matter)no abstracts in English
Uedono, Akira*; *; L.Wei*; *; *; *; Ito, Hisayoshi
Japanese Journal of Applied Physics, 33(8B), p.L1131 - L1134, 1994/08
Times Cited Count：2 Percentile：17.87(Physics, Applied)no abstracts in English
probed by positron annihilationUedono, Akira*; *; *; Ito, Hisayoshi
Journal of Physics; Condensed Matter, 6, p.8669 - 8677, 1994/00
Times Cited Count：26 Percentile：81.18(Physics, Condensed Matter)no abstracts in English
Ito, Hisayoshi; Yoshikawa, Masahito; Nashiyama, Isamu; L.Wei*; *; *; Okumura, Hajime*; Yoshida, Sadafumi*
Hyperfine Interactions, 79, p.725 - 729, 1993/00
Times Cited Count：19 Percentile：73.56(Physics, Atomic, Molecular & Chemical)no abstracts in English
