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Search Results: Records 1-4 displayed on this page of 4

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Journal Articles

Plasma physics and radiation hydrodynamics in developing an extreme ultraviolet light source for lithography

Nishihara, Katsunobu*; Sunahara, Atsushi*; Sasaki, Akira; Nunami, Masanori*; Tanuma, Hajime*; Fujioka, Shinsuke*; Shimada, Yoshinori*; Fujima, Kazumi*; Furukawa, Hiroyuki*; Kato, Takako*; et al.

Physics of Plasmas, 15(5), p.056708_1 - 056708_11, 2008/00

https://doi.org/10.1063/1.2907154

Times Cited Count：122 Percentile：97.46(Physics, Fluids & Plasmas)

Journal Articles

Atomic modeling of the plasma EUV sources

Sasaki, Akira; Sunahara, Atsushi*; Nishihara, Katsunobu*; Nishikawa, Takeshi*; Fujima, Kazumi*; Kagawa, Takashi*; Koike, Fumihiro*; Tanuma, Hajime*

High Energy Density Physics, 3(1-2), p.250 - 255, 2007/05

https://doi.org/10.1016/j.hedp.2007.02.031

Times Cited Count：17 Percentile：49.63(Physics, Fluids & Plasmas)

no abstracts in English

Journal Articles

Effect of the satellite lines and opacity on the extreme ultraviolet emission from high-density Xe plasmas

Sasaki, Akira; Nishihara, Katsunobu*; Murakami, Masakatsu*; Koike, Fumihiro*; Kagawa, Takashi*; Nishikawa, Takeshi*; Fujima, Kazumi*; Kawamura, Toru*; Furukawa, Hiroyuki*

Applied Physics Letters, 85(24), p.5857 - 5859, 2004/12

https://doi.org/10.1063/1.1834994

Times Cited Count：43 Percentile：80.02(Physics, Applied)

no abstracts in English

Journal Articles

Theoretical simulation of extreme UV radiation source for lithography

Fujima, Kazumi*; Nishihara, Katsunobu*; Kawamura, Toru*; Furukawa, Hiroyuki*; Kagawa, Takashi*; Koike, Fumihiro*; More, R.*; Murakami, Masakatsu*; Nishikawa, Takeshi*; Sasaki, Akira; et al.

Emerging Lithographic Technologies VIII, Proceedings of SPIE Vol.5374, p.405 - 412, 2004/00

no abstracts in English