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Ishizawa, Akihiro*; Idomura, Yasuhiro; Imadera, Kenji*; Kasuya, Naohiro*; Kanno, Ryutaro*; Satake, Shinsuke*; Tatsuno, Tomoya*; Nakata, Motoki*; Nunami, Masanori*; Maeyama, Shinya*; et al.
Purazuma, Kaku Yugo Gakkai-Shi, 92(3), p.157 - 210, 2016/03
The high-performance computer system Helios which is located at The Computational Simulation Centre (CSC) in The International Fusion Energy Research Centre (IFERC) started its operation in January 2012 under the Broader Approach (BA) agreement between Japan and the EU. The Helios system has been used for magnetised fusion related simulation studies in the EU and Japan and has kept high average usage rate. As a result, the Helios system has contributed to many research products in a wide range of research areas from core plasma physics to reactor material and reactor engineering. This project review gives a short catalogue of domestic simulation research projects. First, we outline the IFERC-CSC project. After that, shown are objectives of the research projects, numerical schemes used in simulation codes, obtained results and necessary computations in future.
-lactic acid) using electron beam nanoimprint lithographyOkubo, Satoshi*; Nagasawa, Naotsugu; Kobayashi, Akinobu*; Oyama, Tomoko*; Taguchi, Mitsumasa; Oshima, Akihiro*; Tagawa, Seiichi*; Washio, Masakazu*
Applied Physics Express, 5(2), p.027303_1 - 027303_3, 2012/02
Times Cited Count：4 Percentile：18.19(Physics, Applied)Electron beam nanoimprint lithography was proposed for fabricating the micro-/nanostructures of cross-linked poly(-lactic acid) (RX-PLLA). PLLA with triallyl isocyanurate (TAIC) solutions were dropped on the Si-molds fabricated by the conventional EB lithography technique. PLLA/TAIC on Si-molds were imprinted and cross-linked with doses from 10 to 500 kGy at room temperature under vacuum. The micro-/nanostructures of RX-PLLA were successfully obtained with high accuracy. Hence, it was found that the imprinted structures of RX-PLLA (100 kGy irradiation) show low line edge roughness and high thermal durability at 120 
C.
Kobayashi, Akinobu*; Hinata, Toru*; Okubo, Satoshi*; Oyama, Tomoko; Nagasawa, Naotsugu; Taguchi, Mitsumasa; Oshima, Akihiro*; Tagawa, Seiichi*; Washio, Masakazu*
no journal, ,
In this study, a Si mold used for micro/nano fabrication of polytetrafluoroethylene (PTFE) via Thermal and Radiation process for Fabricationprocess (TRaf process) was investigated with X-ray photoelectron spectroscopy. It was found that the surface of Si mold was fluorinated by TRaf process. This fluorinated Si mold was applied for nanoimprint lithography (NIL) of high adhesion material without release agent. As a result, NIL of poly(
-caprolactone) was successfully performed.
