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Xu, S.*; Odaira, Takumi*; Sato, Shunsuke*; Xu, X.*; Omori, Toshihiro*; Harjo, S.; Kawasaki, Takuro; Seiner, H.*; Zoubkov, K.*; Murakami, Yasukazu*; et al.
Nature Communications (Internet), 13, p.5307_1 - 5307_8, 2022/09
Times Cited Count:8 Percentile:73.15(Multidisciplinary Sciences)Horibe, Yoichi*; Mori, Shigeo*; Ikeda, Naoshi*; Yoshii, Kenji; Maeno, Hiroshi*; Murakami, Yasukazu*
Ferroelectrics, 584(1), p.20 - 30, 2021/00
Times Cited Count:2 Percentile:7.51(Materials Science, Multidisciplinary)Temperature dependence of charge-ordered crystal structures and domain structures in RFeO (R: Y and Lu) was investigated by energy-filtered transmission electron microscopy, combined with conventional transmission electron microscopy. The presence of three-dimensional to two-dimensional charge ordering transition were observed in both RFeO on heating. Furthermore, real-space images obtained with the energy-filtered transmission electron microscopy revealed that YRFeO has less anisotropic nanometer-scale charge-ordered domains than LuRFeO. These findings in RFeO indicate the importance of the interchange interactions between Fe-O bilayers in addition to those within bilayers in the structural phase transitions associated with charge ordering in this system.
Izawa, Yasukazu*; Nishihara, Katsunobu*; Tanuma, Hajime*; Sasaki, Akira; Murakami, Masakatsu*; Sunahara, Atsushi*; Nishimura, Hiroaki*; Fujioka, Shinsuke*; Aota, Tatsuya*; Shimada, Yoshinori*; et al.
Journal of Physics; Conference Series, 112, p.042047_1 - 042047_4, 2008/00
Times Cited Count:8 Percentile:93.45(Physics, Fluids & Plasmas)In the development of a high power EUV source used in the EUV lithography system, we have been constructed EUV database of laser-produced tin plasma by the theoretical and experimental studies. On the basis of our understanding, the optimum conditions of lasers and plasmas were clarified, and we proposed the guidelines of laser plasma to obtain clean, efficient and high power EUV source for the practical EUV lithography system. In parallel to such studies, novel targets and high power laser system to generate the optimized EUV source plasma have been developed.
Nishihara, Katsunobu*; Sunahara, Atsushi*; Sasaki, Akira; Nunami, Masanori*; Tanuma, Hajime*; Fujioka, Shinsuke*; Shimada, Yoshinori*; Fujima, Kazumi*; Furukawa, Hiroyuki*; Kato, Takako*; et al.
Physics of Plasmas, 15(5), p.056708_1 - 056708_11, 2008/00
Times Cited Count:122 Percentile:97.47(Physics, Fluids & Plasmas)