Preparation of fluoropolymer-based ion-track membranes; High-sensitive etching achieved by a pretreatment as well as by high-LET beam irradiation

Asano, Masaharu; Yamaki, Tetsuya; Nunung, N.*; Koshikawa, Hiroshi; Hakoda, Teruyuki; Sawada, Shinichi; Hasegawa, Shin; Maekawa, Yasunari

no journal, , 

PVDF thin films irradiated with four kinds of ion beams were etched in a 9 M KOH aqueous solution after their exposure to different oxidizing environments. The irradiation of higher-LET ions, causing each track to more concentrated damage, was preferable to achieve high sensitivity of the etching. Very interestingly, an ozone treatment was found to enhance largely an etch rate in the latent track without a significant change in a bulk etch rate, thereby enabling us to obtain very high etching sensitivity for the preparation of nano-sized through-pores.