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on Cu surfacesMoritani, Kosuke*; Tsuda, Muneyuki*; Teraoka, Yuden; Okada, Michio*; Yoshigoe, Akitaka; Fukuyama, Tetsuya*; Kasai, Toshio*; Kasai, Hideaki*
Journal of Physical Chemistry C, 111(27), p.9961 - 9967, 2007/07
Times Cited Count：15 Percentile：45.85(Chemistry, Physical)We report an X-ray photoemission study of the dissociative adsorption of O at Cu(111), (001), and (110) surfaces with an O molecular beam generated with a variable temperature nozzle. The O-uptake curves, which are produced from precisely measured O-1s peaks, indicate that the dissociative absorption is enhanced as the nozzle temperature is increased up to 1000 K for the normal incidence of O at a kinetic energy of 0.5 eV. However, further increasing the nozzle temperature to 1400 K reduces the probability of dissociativeadsorption. These results suggest that vibrational excitations of incident O assist dissociative adsorption while rotational excitations hinder it.
on Cu surfacesMoritani, Kosuke*; Tsuda, Muneyuki*; Teraoka, Yuden; Okada, Michio*; Yoshigoe, Akitaka; Fukuyama, Tetsuya*; Kasai, Toshio*; Kasai, Hideaki*
no journal, ,
Oxygen molecules adsorbe dissociatively at Cu(111), Cu(110), and Cu(001) surfaces. The oxygen uptake curves were investigated by using supersonic molecular beam techniques and photoemission spectroscopy with synchrotron radiation. Adsorption probability increased with increasing translational kinetic energy of oxygen molecules. Vibrational and rotational levels of oxygen molecules were excited by elevation of nozzle temperature up to 1400 K keeping the incident energy of 0.5 eV. Although the adsorption probability increased with increasing nozzle temperature by 1000 K, it decreased inversely around 1400 K. These phenomena were interpreted as adsorption probability increase by vibrational excitation and decrease by rotational excitation.
