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Nishikino, Masaharu; Ishino, Masahiko; Ichimaru, Satoshi*; Hatayama, Masatoshi*; Hasegawa, Noboru; Kawachi, Tetsuya
Reza Gakkai Dai-483-Kai Kenkyukai Hokoku; Tanhacho Ryoshi Bimu Hassei To Sono Oyo, p.25 - 28, 2015/12
X-ray ablation has been recently achieved using plasma soft X-ray lasers (SXRLs), laser plasma soft X-rays, and X-ray free electron lasers. In order to study the interactions between picosecond SXRL beams and material and multi-layered structure surfaces were irradiated with SXRL pulse. Following irradiation, the substrate surface was observed using a scanning electron microscope and an atomic force microscope. The surface modifications caused by the SXRL beam were clearly seen. The multi-layered mirror is the important component for the EUV lithography. Then, we have started the damage test of multi-layered structure, and the surface modifications caused by the SXRL pulse irradiations were confirmed.
Koike, Masato; Ishino, Masahiko; Imazono, Takashi; Sano, Kazuo*; Sasai, Hiroyuki*; Hatayama, Masatoshi*; Takenaka, Hisataka*; Heimann, P. A.*; Gullikson, E. M.*
Spectrochimica Acta, Part B, 64(8), p.756 - 760, 2009/08
Times Cited Count:9 Percentile:43.04(Spectroscopy)W/C and Co/SiO multilayer laminar-type holographic plane gratings (groove density 1/1200 lines /mm) in the 1-8 keV region are developed. For the Co/SiO grating the diffraction efficiencies of 0.41 and 0.47 at 4 and 6 keV, respectively, and for the W/C grating 0.38 at 8 keV are observed. Taking advantage of the outstanding high diffraction efficiencies into practical soft X-ray spectrographs a Mo/SiO multilayer varied-line-spacing (VLS) laminar-type spherical grating (1/2400 lines /mm) is also developed for use with a flat field spectrograph in the region of 1.7 keV. For the Mo/SiO multilayer grating the diffraction efficiencies of 0.05-0.20 at 0.9-1.8 keV are observed. The FWHM's of the measured line profiles of Hf-M (1644.6 eV), Si-K (1740.0 eV),and W-M (1775.4 eV) are 13.7 eV, 8.0 eV, and 8.7 eV, respectively. It shows the validity of multilayer lamina-type gratings in the region.
Koike, Masato; Ishino, Masahiko; Heimann, P. A.*; Imazono, Takashi; Takenaka, Hisataka*; Hatayama, Masatoshi*; Sasai, Hiroyuki*; Gullikson, E. M.*; Sano, Kazuo*
AIP Conference Proceedings 879, p.647 - 650, 2007/01
no abstracts in English
Ishino, Masahiko; Heimann, P. A.*; Sasai, Hiroyuki*; Hatayama, Masatoshi*; Takenaka, Hisataka*; Sano, Kazuo*; Gullikson, E. M.*; Koike, Masato
Applied Optics, 45(26), p.6741 - 6745, 2006/09
Times Cited Count:12 Percentile:50(Optics)no abstracts in English
Koike, Masato
X-sen Ketsuzo Kogaku Nyuzu Reta, (23), p.3 - 4, 2006/03
no abstracts in English
Koike, Masato; Ishino, Masahiko; Sano, Kazuo*; Takenaka, Hisataka*; Hatayama, Masatoshi*; Sasai, Hiroyuki*; Heimann, P. A.*; Gullikson, E. M.*
no journal, ,
no abstracts in English
Koike, Masato; Ishino, Masahiko; Sano, Kazuo*; Takenaka, Hisataka*; Hatayama, Masatoshi*; Heimann, P. A.*; Gullikson, E. M.*; Sasai, Hiroyuki*
no journal, ,
no abstracts in English
Koike, Masato; Ishino, Masahiko; Takenaka, Hisataka*; Hatayama, Masatoshi*; Sano, Kazuo*; Heimann, P. A.*; Gullikson, E. M.*
no journal, ,
no abstracts in English
Ishino, Masahiko; Koike, Masato; Heimann, P. A.*; Sasai, Hiroyuki*; Hatayama, Masatoshi*; Takenaka, Hisataka*; Sano, Kazuo*; Gullikson, E. M.*
no journal, ,
no abstracts in English
Koike, Masato; Ishino, Masahiko; Heimann, P. A.*; Gullikson, E. M.*; Takenaka, Hisataka*; Hatayama, Masatoshi*; Sasai, Hiroyuki*; Sano, Kazuo*
no journal, ,
no abstracts in English
Koike, Masato; Ishino, Masahiko; Sano, Kazuo*; Sasai, Hiroyuki*; Takenaka, Hisataka*; Hatayama, Masatoshi*; Heimann, P. A.*; Gullikson, E. M.*
no journal, ,
no abstracts in English