The Postspinel Phase Boundary in Mg $_{2}$ SiO $_{4}$ Determined by in Situ X-ray Diffraction

Irifune, Tetsuo*; Nishiyama, Norimasa*; Kuroda, Koji*; Inoue, Toru*; Isshiki, Maiko*; Utsumi, Wataru; Funakoshi, Kenichi*; Urakawa, Satoru*; Uchida, Takeyuki*; Katsura, Tomoo*; Otaka, Osamu*

no abstracts in English

Language	:	English
Journal	:	Science
Volume	:	279
Number	:	5357
Pages	:	p.1698 - 1700
Publication Year/Month	:	1998/03
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Paper URL	:	https://doi.org/10.1126/science.279.5357.1698
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Keywords	:	ポストスピネル; Mg $_{2}$ SiO $_{4}$ ; 放射光; 高温; 高圧
Research Facility	:	SPring-8(大型放射光施設)
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Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:93.63 Category:Multidisciplinary Sciences
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Registration No. : A20020259
JAEA Abstracts No. : 301065
Paper Submission No. : 19502

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The Postspinel Phase Boundary in MgSiO Determined by in Situ X-ray Diffraction

The Postspinel Phase Boundary in Mg $_{2}$ SiO $_{4}$ Determined by in Situ X-ray Diffraction