Optimization of the silicon oxide layer thicknesses inserted in the Mo/Si multilayer interfaces for high heat stability and high reflectivity

no abstracts in English

Language	:	English
Journal	:	Journal of Applied Physics
Volume	:	92
Number	:	9
Pages	:	p.4952 - 4958
Publication Year/Month	:	2002/11
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Paper URL	:	https://doi.org/10.1063/1.1510566
DOI for research data	:
Keywords	:	Mo/Si多層膜; SiO $_{2}$ 層厚; 耐熱性; 軟X線反射率
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Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:28.33 Category:Physics, Applied
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Registration No. : A20020226
JAEA Abstracts No. : 310056
Paper Submission No. : 19720

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