In-situ photoemission spectroscopy for chemical reaction dynamics study of Si(001) oxidation by using high-energy-resolution synchrotron radiation

Teraoka, Yuden; Yoshigoe, Akitaka

The translational kinetic energy of incident molecules is an important parameter for the study of surface chemical reaction mechanisms. New adsorption reactions, induced by the O $_{2}$ translational kinetic energy of several eV, have been found in the O $_{2}$ /Si(001) system by applying the surface photoemission spectroscopy with supersonic molecular beam techniques and the high-energy-resolution synchrotron radiation. The termination of dangling bonds affected dominantly the oxidation of dimer backbonds. By controlling the translational kinetic energy of incident O $_{2}$ molecules, the formation of oxide-layers with a sub-nanometer scale is possible at room temperature.

Language	:	Japanese
Journal	:	Oyo Butsuri
Volume	:	71
Number	:	2
Pages	:	p.1523 - 1527
Publication Year/Month	:	2002/12
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Paper URL	:	http://joi.jlc.jst.go.jp/JST.Journalarchive/oubutsu1932/71.1523
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Keywords	:	Synchrotron Radiation; Photoemission Spectroscopy; Translational Kinetic Energy; Supersonic Molecular Beam; Silicon; Oxidation; Initial Adsorption Probability
Research Facility	:	SPring-8(大型放射光施設)
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Registration No. : A20020332
JAEA Abstracts No. : 310074
Paper Submission No. : 19738

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