Kinetic energy released distributions of H $^{+}$ ions desorbed from H $_{2}$ O/Si(100) adsorption system by O 1s excitation

Sekiguchi, Tetsuhiro ; Ikeura, Hiromi*; Obi, Kinichi*; Tanaka, Kenichiro*

no abstracts in English

Language	:	English
Journal	:	Photon Factory Activity Report
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Pages	:	P. 128
Publication Year/Month	:	1994/00
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Keywords	:	放射光; 光刺激脱離; 運動エネルギー; 水; シリコン; H $_{2}$ O; Si
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Registration No. : A19940510
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Kinetic energy released distributions of H ions desorbed from HO/Si(100) adsorption system by O 1s excitation

Kinetic energy released distributions of H $^{+}$ ions desorbed from H $_{2}$ O/Si(100) adsorption system by O 1s excitation