A Large multicusp source producing a 10A,50keV,0.1s H $^{-}$ ion beam

Kojima, Hiroaki; Hanada, Masaya; Inoue, Takashi; not registered; Ohara, Yoshihiro; Okumura, Yoshikazu; Ohara, Hiroshi; Seki, Masahiro; Watanabe, Kazuhiro

no abstracts in English

Language	:	English
Journal	:	Proc. of the 13th Symp. on Ion Sources and Ion-Assisted Technology,Vol. 1
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Pages	:	4 Pages
Publication Year/Month	:	1990/06
Meeting title	:	イオン源とイオンを基礎とした応用技術(第13回イオン工学シンポジウム)
Held date	:	1990/06
Location (city)	:	東京
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Keywords	:	負イオン源; H $^{-}$ ; 粒子入射加熱装置; セシウム; 多極磁場型プラズマ源; イオンビーム
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Registration No. : B19900155
JAEA Abstracts No. :
Paper Submission No. : 9836

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A Large multicusp source producing a 10A,50keV,0.1s H ion beam

A Large multicusp source producing a 10A,50keV,0.1s H $^{-}$ ion beam