Dissociative scattering of low-energy SiF $_{3+}$ and SiF $^{+}$ ions (5-200eV) on Cu(100) surface

Yamamoto, Hiroyuki; Baba, Yuji ; Sasaki, Teikichi

no abstracts in English

Language	:	English
Journal	:	Applied Surface Science
Volume	:	100-101
Number	:
Pages	:	p.333 - 337
Publication Year/Month	:	1996/00
Meeting title	:	13th Int. Vacuum Congress/9th Int. Conf. on Solid Surfaces
Held date	:	1995/09
Location (city)	:	横浜
Location (country)	:
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1016/0169-4332(96)00236-X
DOI for research data	:
Keywords	:	低エネルギーイオン; イオン散乱; 質量分析; 解離
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:49.91 Category:Chemistry, Physical
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Registration No. : B19950046
JAEA Abstracts No. : 240849
Paper Submission No. : 14261

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Dissociative scattering of low-energy SiF and SiF ions (5-200eV) on Cu(100) surface

Dissociative scattering of low-energy SiF $_{3+}$ and SiF $^{+}$ ions (5-200eV) on Cu(100) surface