Rate of production of water vapour in low-power,high-repetition-rate discharge cleaning

not registered; not registered; not registered

no abstracts in English

Language	:	English
Journal	:	Japanese Journal of Applied Physics
Volume	:	25
Number	:	2
Pages	:	p.253 - 257
Publication Year/Month	:	1986/00
Meeting title	:
Held date	:
Location (city)	:
Location (country)	:
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1143/JJAP.25.253
DOI for research data	:
Keywords	:	トカマク; JFT-2; TDC; ガス圧依存性; プラズマ電流依存性; 繰り返し周期依存性; P $_{H}$ $_{2}$ $_{O}$ の時間変化
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:54.39 Category:Physics, Applied
Altmetrics	:

Registration No. : A19855436
JAEA Abstracts No. :
Paper Submission No. : 7661

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.