Synchrotron radiation photoelectron emission study of SiO $_{2}$ film formed by a hyperthermal O-atom beam at room temperature

Tagawa, Masahito*; Sogo, Chie*; Yokota, Kumiko*; Hachiue, Shunsuke; Yoshigoe, Akitaka ; Teraoka, Yuden

Si oxide layers formed on Si(001) substrates by irradiation of hyperthermal oxygen atomic beams at room temperature were analysed at the JAERI soft X-ray beamline by photoemission spectroscopy. It was found that sub-oxide components were scarcely observed in the Si oxide layers formed by the atomic oxygen beam.

Language	:	English
Journal	:	Japanese Journal of Applied Physics
Volume	:	44
Number	:	12
Pages	:	p.8300 - 8304
Publication Year/Month	:	2005/12
Meeting title	:
Held date	:
Location (city)	:
Location (country)	:
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1143/JJAP.44.8300
DOI for research data	:
Keywords	:	Si(001); SiO $_{2}$ ; Oxidation; Photoemission Spectroscopy; Synchrotron Radiation; Hyperthermal Atomic Oxygen Beam; Sub-oxide
Research Facility	:	SPring-8(大型放射光施設)
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:	神戸大学

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:21.82 Category:Physics, Applied
Altmetrics	:

Registration No. : A20050231
JAEA Abstracts No. : 34000084
Paper Submission No. : 233

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.

Synchrotron radiation photoelectron emission study of SiO film formed by a hyperthermal O-atom beam at room temperature

Synchrotron radiation photoelectron emission study of SiO $_{2}$ film formed by a hyperthermal O-atom beam at room temperature