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Synchrotron radiation photoelectron emission study of SiO$$_{2}$$ film formed by a hyperthermal O-atom beam at room temperature

超熱酸素原子ビームで室温形成したSiO$$_{2}$$膜の放射光光電子分光研究

田川 雅人*; 十河 千恵*; 横田 久美子*; 鉢上 隼介; 吉越 章隆; 寺岡 有殿

Tagawa, Masahito*; Sogo, Chie*; Yokota, Kumiko*; Hachiue, Shunsuke; Yoshigoe, Akitaka; Teraoka, Yuden

神戸大学が持つ酸素原子ビーム装置を用いてSi(001)基板上に室温で作製したシリコン酸化膜をSPring-8の原研軟X線ビームラインで光電子分光解析した。酸素原子ビームで作製したシリコン酸化膜では通常の熱酸化膜に比べてサブオキサイドが少ないことが明らかになった。

Si oxide layers formed on Si(001) substrates by irradiation of hyperthermal oxygen atomic beams at room temperature were analysed at the JAERI soft X-ray beamline by photoemission spectroscopy. It was found that sub-oxide components were scarcely observed in the Si oxide layers formed by the atomic oxygen beam.

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パーセンタイル:76.68

分野:Physics, Applied

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