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In ${it situ}$ monitoring of internal strain and height of InAs nanoislands grown on GaAs(001)

Takahashi, Masamitsu; Kaizu, Toshiyuki; Mizuki, Junichiro

A monitoring technique for molecular beam epitaxial growth of InAs/GaAs(001) nanoislands is presented. With the help of synchrotron radiation, X-ray diffraction intensity mapping in reciprocal space has been measured during growth. The internal strain distribution and height of the Stranski-Krastanov islands were monitored at a temporal resolution of 9.6 s. The relaxation process of internal strain inside the Stranski-Krastanov islands displayed significant dependence on the growth temperature.

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Category:Physics, Applied

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