検索対象:     
報告書番号:
※ 半角英数字
 年 ~ 
 年

Local oxidation induced by inhomogeneous stress on blistered Si surface

ブリスター生成したシリコン表面の応力変調による局所酸化状態の観察

五十嵐 慎一*; 板倉 明子*; 北島 正弘*; 中野 伸祐*; 武藤 俊介*; 田辺 哲朗*; 山本 博之; 北條 喜一

Igarashi, Shinichi*; Itakura, Akiko*; Kitajima, Masahiro*; Nakano, Shinsuke*; Muto, Shunsuke*; Tanabe, Tetsuo*; Yamamoto, Hiroyuki; Hojo, Kiichi

表面に局所的なストレスが加えられた場合、その反応性が変化する可能性が指摘されている。本研究ではシリコン基板に10$$sim$$13keVの水素イオンを照射(10$$^{22}$$ions/m$$^{2}$$)することにより局所的なふくれ(ブリスター)を作製し、ストレスの及ぼす表面反応性の変化に関する検討を試みた。この試料を大気曝露し表面を酸化させたところ、ブリスターの形状を反映した酸素分布が観測された。ブリスター形成による局所的なストレスが、酸化速度が促進させたためと考えられる。得られた結果から、ストレスを何らかの方法で変調させ局所的な表面反応の制御やパターニングが可能であることを明らかにした。

By utilizing surface stress to modify surface reaction potential and increase surface reactivity, a technique for the twodimensional patterning of surface chemical reactions may be realized by surface stress modulation. A blister is a local protrusion on a solid surface induced by gas ion irradiation, and is considered to create local stress on surface layers. Si(100) substrate was irradiated with H$$^{+}$$ (incident energy: 10 keV, fluence: 1$$times$$10$$^{22}$$ ions) at an angle of 30 to the surface normal. Blisters of 1-5 mm in diameter at the base were formed. After the ion irradiation, the substrate was oxidized. Scanning Auger electron microscopy revealed that, compared with the flat surface, the perimeters of the blisters had a higher oxygen intensity whereas the blister tops had a lower oxygen intensity. The stress distribution of the blister was calculated using the finite element method. It was found that the surface layers were stretched laterally at the blisters tops and compressed at theperimeters, relative to the flat surface. There was a clear correspondence between the O distribution and the stress distribution on the surface. Our results indicate that the patterned oxidation of the Si surface can be governed by the application of surface stress.

Access

:

- Accesses

InCites™

:

パーセンタイル:84.58

分野:Physics, Applied

Altmetrics

:

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.