Gasochromic properties of nanostructured tungsten oxide films prepared by sputtering deposition

Takano, Katsuyoshi; Inoue, Aichi; Yamamoto, Shunya; Sugimoto, Masaki; Yoshikawa, Masahito; Nagata, Shinji*

The amorphous, polycrystalline, and oriented films of the tungsten oxide were fabricated by sputtering deposition. It is found that each film has different roughness in the surface. The films with rough surface show fast coloration in 1% hydrogen. There is possibility that the gasochromic properties are improved effectively by the control of the surface morphology, and the films with large grains on the surface have better gasochromic coloration.

Language	:	English
Journal	:	Japanese Journal of Applied Physics, Part 1
Volume	:	46
Number	:	9B
Pages	:	p.6315 - 6318
Publication Year/Month	:	2007/09
Meeting title	:	19th International Microprocesses and Nanotechnology Conference (MNC 2006)
Held date	:	2006/10
Location (city)	:	Kamakura
Location (country)	:	Japan
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1143/JJAP.46.6315
DOI for research data	:
Keywords	:	no keyword
Research Facility	:	TIARA(イオン照射研究施設)
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:

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InCites™	:	Percentile:39.2 Category:Physics, Applied
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Registration No. : BB20061488
JAEA Abstracts No. : 35001684
Paper Submission No. : 3248

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