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Report No.

ZnO as fast EUV scintillator for the next generation lithography

Tanaka, Momoko; Furukawa, Yusuke*; Murakami, Hidetoshi*; Sarukura, Nobuhiko*; Nishikino, Masaharu; Nagashima, Keisuke; Kimura, Toyoaki; Yamatani, Hiroshi; Yoshikawa, Akira*; Fukuda, Tsuguo*

Using Ni-like Ag extreme ultraviolet (EUV) laser operated at 13.9-nm, ZnO is shown to be the excellent scintillator in this wavelength region with sufficiently short response time of less than 3 nsec and prominent peak fluorescence originated form exciton at 380 nm.



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