AFM investigation on surface evolution of amorphous carbon during ion-beam-assisted deposition

Zhu, X. D.*; Ding, F.*; Naramoto, Hiroshi*; Narumi, Kazumasa

Hydrogen-free amorphous carbons (a-C) have been prepared on mirror-polished Si(111) wafers through thermally evaporated C with simultaneous bombardments of Ne ions. The time evolution of film surfaces has been characterized by atomic force microscopy (AFM) at two temperatures of 400 and 700 C. Based on the topography images and the root-mean-square (rms) roughness analysis, it is found that the a-C surfaces present roughening growth at the initial stage. With increasing growth time, the cooperative nucleation of the islands and pits appears on the surfaces, suggesting three-dimensional growth, and then they continue to evolve to irregular mounds at 400 C, and elongated mounds at 700 C. At the steady growth stage, these surfaces further develop to the structures of bamboo joints and ripples corresponding to these two temperatures, respectively. It is believed that besides ion sputtering effect, the chemical bonding configurations in the amorphous carbon films should be taken into considerations for elucidating the surface evolutions.