Real time observation of O $_{2}$ adsorption process on Si(111)-77 at 300K by using synchrotron radiation photoelectron spectroscopy; Time evolution and its correlation of O1s and Si2p

Yoshigoe, Akitaka ; Teraoka, Yuden

We have reported the incident energy dependece of initial sticking probability, saturation coverage and metastable adsorebed oxygen molecule for O $_{2}$ adsorption on Si(111)-77 at 300K. Though the initial adsorption dynamics is emerging, the time evolution of adsorption states progressing to the saturation has not been clear yet. As a reult of measuring the time evolution of both O1s and Si2p XPS, we found the close relationships between those components.

Language	:	Japanese
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Meeting title	:	第27回表面科学講演大会
Held date	:	2007/11
Location (city)	:	東京
Location (country)	:	日本
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Registration No. : BB20071584
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Real time observation of O adsorption process on Si(111)-77 at 300K by using synchrotron radiation photoelectron spectroscopy; Time evolution and its correlation of O1s and Si2p

Real time observation of O $_{2}$ adsorption process on Si(111)-77 at 300K by using synchrotron radiation photoelectron spectroscopy; Time evolution and its correlation of O1s and Si2p