Characterization of BCN films synthesized by radiofrequency plasma enhanced chemical vapor deposition

Mannan, M. A.*; Nagano, Masamitsu*; Kida, Tetsuya*; Hirao, Norie; Baba, Yuji  

Boron carbonitride (BCN) films have been synthesized on Si(100) substrate by radio frequency plasma enhanced chemical vapor deposition using Tris-(dimethylamino)borane (TDMAB) as a precursor. The formation of the sp-bonded BCN phase was confirmed by Fourier transform infrared spectroscopy. X-ray photoelectron spectroscopy measurements showed that B atoms were bonded to C and N atoms to form the BCN atomic hybrid configurations. Near-edge X-ray absorption fine structure measurements indicated that B atoms were bonded not only to N atoms but also to C atoms to form various configurations of sp-BCN atomic hybrids. The polarization-dependence of NEXAFS suggested that the predominant hybrid configuration of sp-BCN films oriented in the direction perpendicular to the Si substrate.