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Two dimensional radiation hydrodynamic simulation for extreme ultra-violet emission from laser-produced tin plasmas

Sunahara, Atsushi*; Sasaki, Akira; Nishihara, Katsunobu*

We simulated Extreme Ultra-Violet (EUV) emission from laser-produced tin plasmas for the lithography of semi-conductor, using one- and two- dimensional radiation hydrodynamic simulation codes, and benchmarked the simulations by comparison with recent experiments. We successfully reproduced the measured conversion efficiency, X-ray spectra, and plasma density profiles in the experimental conditions. We found self-absorption of radiation due to the large opacity plays an important role in emission.

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