Ultra thin AlN layer formation at Al(111) surface by supersonic N beams

Teraoka, Yuden; Yoshigoe, Akitaka 

The Al(111) surface has been directly nitrided by supersonic N molecular beams at 473 K. A translational kinetic energy threshold of the nitridation was 1.8 eV. A nitrogen uptake curve obtained at the translational energy of 2.0 eV showed a linear profile with the nitrogen dose indicating non-protective layer formation. Al-2p photoemission spectra were involved a merely-shifted shoulder structure in the higher binding energy side so that sub-nitride components were included in the AlN overlayer.