Depth-profiling using angular-resolved X-ray photoelectron spectroscopy and the maximum entropy method

Harries, J.; Tode, Mayumi; Sumimoto, Yuichi; Inoue, Keisuke; Yoshigoe, Akitaka ; Teraoka, Yuden

Photoelectron spectroscopy is predominantly a surface-sensitive technique, but by recording spectra at a range of angles information on the depth-dependent distribution of elements in specific chemical states can also be obtained. Compared to other techniques such as Rutherford back-scattering, the technique has the advantage of chemical-state specificity, but the drawback that it requires very careful data analysis to produce reliable and quantitative results. Here we report progress in obtaining chemical-state depth profiles from photoelectron spectra recorded using the SUREAC2000 apparatus at SPring-8's BL23SU. Results will be presented for ARXPS data recorded for N and O layers on Al(111), and also a VCrTi sample, both in its as-received state and following deuterium ion dosing.