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X-ray photoelectron and X-ray absorption spectroscopic study on $$beta$$-FeSi$$_{2}$$ thin films fabricated by ion beam sputter deposition

Esaka, Fumitaka; Yamamoto, Hiroyuki; Matsubayashi, Nobuyuki*; Yamada, Yoichi*; Sasase, Masato*; Yamaguchi, Kenji; Shamoto, Shinichi; Magara, Masaaki; Kimura, Takaumi

A combination of X-ray photoelectron spectroscopy (XPS) and X-ray absorption spectroscopy (XAS) using synchrotron radiation is applied to clarify surface chemical states of $$beta$$-FeSi$$_{2}$$ films fabricated by an ion-beam sputtering deposition method. The differences in the chemical states of the films fabricated at substrate temperatures of 873, 973 and 1173 K are investigated.



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Category:Chemistry, Physical



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