Deuterium trapping in tungsten deposition layers formed by deuterium plasma sputtering

Alimov, V.; Roth, J.*; Shu, Wataru*; Komarov, D. A.*; Isobe, Kanetsugu; Yamanishi, Toshihiko

A study of the influence of the deposition conditions on the surface morphology and deuterium concentration in tungsten deposition layers formed by magnetron sputtering and in the linear plasma generator has been carried out. Adhesion of the W layer to substrate is shown to depend on the coefficients of thermal expansion for tungsten and substrate material, thickness of the W layer, and the substrate temperature during layer deposition. A decreased D concentration for increased substrate temperatures and deposition rate are observed.

Language	:	English
Journal	:	Journal of Nuclear Materials
Volume	:	399
Number	:	2-3
Pages	:	p.225 - 230
Publication Year/Month	:	2010/04
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Paper URL	:	https://doi.org/10.1016/j.jnucmat.2010.01.024
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Keywords	:	no keyword
Research Facility	:	TPL(トリチウムプロセス研究棟)
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Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:89.14 Category:Materials Science, Multidisciplinary
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Registration No. : AA20090797
JAEA Abstracts No. : 38000612
Paper Submission No. : 7202

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