Focal spot characterization of EUVFEL using a LiF crystal detector

Fukuda, Yuji; Faenov, A. Y.; Pikuz, T. A.*; Ohashi, Haruhiko*; Semba, Yasunori*; Nagasono, Mitsuru*; Tono, Kensuke*; Togashi, Tadashi*; Yabashi, Makina*; Ishikawa, Tetsuya*

We have conducted detailed focused spot shape measurements for EUVFEL using a LiF crystal radiation detector. The single shot focused spot images were recorded on the LiF detector surface as a function of detector position. As a result, we found that the spot images were distorted due to aberrations, and that laser beam was focused about 1-mm up to the laser beam axis. Moreover, we found that the LiF crystal was ablated due to high intensity of the focused beam.

Language	:	Japanese
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Meeting title	:	第4回XFEL利用ワークショップ
Held date	:	2010/03
Location (city)	:	東京
Location (country)	:	日本
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Keywords	:	no keyword
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Article of JAEA R&D Review	:
Cooperating Institute	:	理化学研究所

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Registration No. : BB20093704
JAEA Abstracts No. :
Paper Submission No. :

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