Refine your search:     
Report No.

Physics and future of the laser pumped plasma XUV sources

Sasaki, Akira; Nishihara, Katsunobu*

Extension of the laser pumped plasma (LPP) EUV source toward shorter wavelength is discussed. Properties of the emission from the 4d-4f + 4p-4d transition array of 4d open-shell ions, which has been used for the lithographic EUV source at $$lambda$$=13.5nm using Sn target, are investigated. Using calculated emissivity, opacity, and spectral efficiency, the conversion efficiency (CE) for each ion at their characteristic emission wavelength is investigated, showing the LPP can be scalable down to $$lambda$$=6.5nm using Gd target, even the estimated irradiation intensity of $$10^{11} rm W/cm^2$$ demands considerable improvement of laser technologies. Possibility and further requirement to the theoretical method for the prediction of the performance of LPP EUV source are also discussed.



- Accesses





[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.