Thermal degradation analysis of deuterium ion implanted hydrogen storage material (TiFe and VCrTi) using synchrotron radiation photoelectron spectroscopy

Tode, Mayumi; Harries, J.; Teraoka, Yuden; Yoshigoe, Akitaka 

In order to study the relationships between the thermal desorption of hydrogen and the surface properties, we have used high-resolution synchrotron radiation X-ray photoelectron spectroscopy to study the thermal degeneration processes of the surface layers. The experiments were performed at the JAEA soft X-ray beamline BL23SU at SPring-8, using the "SUREAC2000" surface reaction analysis apparatus. XPS spectra were recorded for room temperature TiFe and VCrTi following flash heating to 373-1073 K. Spectra were recorded for two samples covered with native oxide layers, one of which was implanted with deuterium ions. In the deuterium-implanted TiFe, the temperature to which it begins to resolve the oxide component has lowered at about 200-250 C. On the other hand, in VCrTi, the thermal stability of a surface natural oxide layer has increased by the deuterium-implanted.