Development of a negative hydrogen ion source for spatial beam profile measurement of a high intensity positive ion beam

大強度正イオンビームのビームプロファイル測定のための水素負イオン源の開発

神藤 勝啓   ; 和田 元*; 西田 睦聡*; 出村 康拡*; 佐々木 大地*; 津守 克嘉*; 西浦 正樹*; 金子 修*; 木崎 雅志*; 笹尾 眞實子*

Shinto, Katsuhiro; Wada, Motoi*; Nishida, Tomoaki*; Demura, Yasuhiro*; Sasaki, Daichi*; Tsumori, Katsuyoshi*; Nishiura, Masaki*; Kaneko, Osamu*; Kisaki, Masashi*; Sasao, Mamiko*

A negative ion beam probe system has been proposed as a new tool to diagnose beam profiles of high intensity positive ion beams such as the high intensity continuous-wave (CW) D beam for the International Fusion Materials Irradiation Facility (IFMIF). To monitor beam profile of the positive ion beam from a remote position, a negative ion beam is injected into the positive ion beam perpendicularly, and the negative-ion-beam attenuation due to the beam-beam interaction is measured at each point. In a low barycentral energy region, the additional electrons of the negative ions with the small electron affinity are easily detached by collisions with the positive ions. To validate the system capability, an experimental study with a low-energy intense He beam system has been started for the proof-of-principle (PoP) experiment. For the probe beam source, an H ion source to produce the H beam with a rectangular shape of 70 mm 2 mm has been designed and assembled. The long side of the rectangle can cover the entire cross section of the He beam around the focal point, while the short side should be thin not to disturb the target beam. It is installed on a small test stand to measure the beam quality of the H beam. Experimental results of the H beam extracted from the small source will be presented.